Seamless knitting anti-electromagnetic radiation clothing and manufacturing method thereof

A kind of anti-electromagnetic radiation, seamless technology, applied in the direction of weft knitting, textiles, papermaking, knitting, etc., can solve the problems of low shielding efficiency, uncomfortable wearing fabrics, etc., to achieve increased shielding performance, soft texture, good conductivity. Effect

Active Publication Date: 2011-08-03
GUANGDONG RUIYUAN TECH
View PDF6 Cites 8 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The existing anti-electromagnetic radiation clothing has low shielding efficiency, and the fabric is uncomfortable to wear after finishing

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0035] Example 1: A one-time forming seamless woven anti-electromagnetic radiation waist dress

[0036] It is composed of two layers of outer knitted fabric and inner shielding fabric. The second layer of fabric is woven by conventional seamless weft knitting technology. The fiber ratio of the outer knitted fabric is calculated by weight percentage. PA6 DTY 78dtex filament: 85%~90%, the requirements for the false twist deformation processing of DTY filaments are S and Z two twist directions, using S and Z two twist directions for weaving, PU / PA66 20 / 30dtex two-component coating Yarn fiber: 5%~10%; fiber ratio of inner knitted fabric, by weight percentage, PA6 78dtex DTY filament: 50%~55%, A-11 silver fiber 44dtex: 45%~50%, chest and waist 1. The abdomen is woven into the waist dress blank by different weaving techniques; the loom control program is designed by computer, the outer fabric adopts plain weave, rib weave and jacquard weave structure, PA6 is the veil, PU / PA66 is the...

Embodiment 2

[0037] Embodiment 2: A kind of manufacturing method of seamlessly woven anti-electromagnetic radiation clothing

[0038] 1) Fabric weaving: It is composed of two layers of outer knitted fabric and inner shielding fabric. The second layer of fabric is woven by conventional seamless weft knitting technology. The fiber ratio of the outer knitted fabric is calculated by weight percentage. PA6 DTY 78dtex filament: 85%~90%, the requirement for false twist deformation processing of DTY filament is S, Z two twist directions, use S, Z two twist directions for weaving, PU / PA66 20 / 30dtex two-component covered yarn fiber: 5%~10%; inner layer knitted fabric fiber ratio, by weight percentage, PA6 78dtex DTY filament: 50%~55%, A-11 silver fiber 44dtex: 45%~ 50%;

[0039] 2), including conventional scouring, water washing, chlorine bleaching or oxygen bleaching, water washing, post-treatment, dehydration, drying, ironing and other processes, the process includes: scouring-water washing-chlo...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to seamless knitting anti-electromagnetic radiation clothing and a manufacturing method thereof. The seamless knitting anti-electromagnetic radiation clothing consists of two layers of fabrics which are outer knitting fabric and inner shielding fabric. The outer knitting fabric comprises the following fiber compositions by weight percentage: 80-90 percent of chinlon 6 stretch yarns, 5-10 percent of chinlon 66 stretch yarns and 5-10 percent of spandex elastic fiber yarns; and the inner knitting fabric comprises the following fiber compositions by weight percentage: 50-55 percent of chinlon 6 stretch yarns and 45-50 percent of silver metal conductive fiber yarns; and after assistants such as 3 percent of leveling agents, 4 percent of detergents, 4 percent of creasing agents, 2 percent of penetrants and 0.5 percent of ammonium sulfate are added, an appropriate amount of dyes is added again. The seamless knitting anti-electromagnetic radiation clothing has the advantages of anti-electromagnetic radiation and good shielding effect and is comfortable to wear.

Description

technical field [0001] The invention relates to a seamlessly woven anti-electromagnetic radiation garment and a manufacturing method thereof. Background technique [0002] Electromagnetic wave pollution is the fourth major public hazard. Electromagnetic pollution brings serious harm to human health, especially to pregnant women and fetuses. Conductive fiber textiles are a good electromagnetic shielding material. Electromagnetic shielding properties and the softness and breathability of textiles; seamless knitted garments are garments with three-dimensional curved surfaces made of different tube diameters and needle numbers, structural organization, raw material fibers and knitting processes, and are produced by using fiber yarns through looms Clothing blanks are made at one time, and its structural design is different from that of garments cut and sewn from flat fabrics. It can be cut and stitched or stitches omitted, so it is called one-time forming garments; garments that ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G21F3/02G21F1/12D04B1/14D04B1/24
Inventor 许育瑞肖文霞许育生李家成
Owner GUANGDONG RUIYUAN TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap