Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Composite ceramic polishing chip and preparation method thereof

A technology of composite ceramics and grinding blocks, which is applied in the field of abrasive materials, can solve the problems of extremely high requirements on the shape, particle size and material of abrasives, the inability to form automatic assembly line operations, and troubles in the polishing of chip electronic materials, so as to inhibit the abnormal growth of grains , Improve the polishing effect and stabilize the polishing quality

Active Publication Date: 2012-10-03
HUZHOU XING XING ABRASIVE
View PDF2 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] At present, the polishing of chip electronic materials (including various types of ceramic substrates, fully printed electronic circuit boards, various chips, ceramic capacitor substrates and other sheet materials) is basically done by traditional powder polishing technology. There are problems such as low processing efficiency, small processing output, inability to produce continuously, and inability to form automatic assembly line operations, and only one-sided or double-sided polishing can be performed on the workpiece, and it cannot be polished in all directions, so the polishing effect of the traditional method is not ideal. , Unstable polishing quality
If one-sided or double-sided grinding and polishing machine equipment is used to polish chip electronic materials, the equipment is expensive, the operation is difficult, the shape, particle size and material of the abrasive are extremely demanding, and a large amount of chemical additives is required, which will pollute the environment. bigger
[0003] The above problems are technical problems that have plagued the polishing of chip electronic materials for a long time, and have not been effectively solved for a long time

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0024] Example 1. A composite ceramic polishing block, which is prepared by mixing 2 parts of raw materials and 8 parts of binder with water in parts by weight, and then kneading, extruding and sintering; the raw material is 95% alumina It is mixed with 5% zirconia base material; the binder is mixed with 55% kaolin and 45% potassium feldspar. The zirconia base material is formed by mixing 99% zirconia and 1% yttrium oxide.

[0025] The raw material and binding agent are made according to the following steps;

[0026] (1) Mix 10-15% of powdery raw material and powdery binder, add water and stir evenly to obtain product A;

[0027] (2), put A product into the vacuum kneading furnace and knead, and knead twice under the pressure of -0.09Mpa to get B product;

[0028] (3), extruding product B into a spherical shape with a diameter of 2 to 8 mm to obtain product C;

[0029] (4) Put product C into a sintering furnace for sintering, and sinter at a temperature of 1200° C. for 60 ...

Embodiment 2

[0030] Example 2. A composite ceramic polishing block, which is prepared by mixing 4 parts of raw materials and 6 parts of binder with water in parts by weight, and then kneading, extruding and sintering; the raw material is 85% alumina It is mixed with 15% zirconia base material; the binder is 65% kaolin and 35% potassium feldspar; the zirconia base material is 97% zirconia and 3 % yttrium oxide; the particle size of alumina in the raw material of the composite ceramic polishing block is 1300 mesh powder, and the particle size of zirconia and yttrium oxide in the raw material can be nano-scale powder.

[0031] The raw material and binding agent are made according to the following steps;

[0032] (1) Mix 10-15% of powdery raw material and powdery binder, add water and stir evenly to obtain product A;

[0033] (2), put A product into the vacuum kneading furnace and knead, and knead twice under the pressure of -0.1Mpa to get B product;

[0034] (3), extruding product B into a...

Embodiment 3

[0036] Example 3. A composite ceramic polishing block, which is prepared by mixing 3 parts of raw materials and 7 parts of binder with water in parts by weight, kneading, extrusion molding and sintering; the raw material is 90% alumina It is mixed with 10% zirconia base material; the binder is 60% kaolin and 40% potassium feldspar; the zirconia base material is 98% zirconia and 2 % yttrium oxide; the particle size of alumina in the raw material of the composite ceramic polishing block is a powdery substance of 1250 mesh, and the particle size of zirconia and yttrium oxide in the raw material is a nanoscale powdery substance.

[0037] The raw material and binding agent are made according to the following steps;

[0038] (1) Mix 10-15% of powdery raw material and powdery binder, add water and stir evenly to obtain product A;

[0039] (2), put A product into the vacuum kneading furnace and knead, and knead twice under the pressure of -0.095Mpa to get B product;

[0040] (3), e...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
particle sizeaaaaaaaaaa
Login to View More

Abstract

The invention discloses a composite ceramic polishing chip and a preparation method thereof. The composite ceramic polishing chip is prepared by the following steps of: adding water into 2 to 4 weight parts of raw material and 6 to 8 weight parts of binding agent, mixing and stirring uniformly, mixing, performing extrusion molding and sintering, wherein the raw material is the mixture which comprises 85 to 95 percent of aluminum oxide and 5 to 15 percent of zirconium oxide base stock, and the bonding agent is the mixture which comprises 55 to 65 percent of kaolin and 35 to 45 percent of potash feldspar, and the zirconium oxide base stock is the mixture which comprises 97 to 99 percent of zirconium oxide and 1 to 3 percent of yttrium oxide. In the method, nano powder raw materials are bonded by using the bonding agent to form a spherical polishing chip. A chip electronic material is polished by using the polishing chip instead of the conventional powder abrasive material. The method iseasy to operate, chemical aids are not needed to be added and pollution to the environment is small. The used equipment has low manufacturing cost, not only can perform one-side or double-side polishing processing, but also can perform omnibearing polishing, and can improve the polishing effect and stabilizing the polishing quality. The formula of the polishing chip is reasonable, and the polishing chip has high abrasive resistance, toughness and strength. After being sintered, the grains are refined and the grinding quality of workpieces is improved.

Description

technical field [0001] The invention relates to a polishing material used in the grinding industry and a preparation method thereof, in particular to a composite ceramic polishing block and a preparation method thereof, belonging to the technical field of grinding materials. Background technique [0002] At present, the polishing of chip electronic materials (including various types of ceramic substrates, fully printed electronic circuit boards, various chips, ceramic capacitor substrates and other sheet materials) is basically done by traditional powder polishing technology. There are problems such as low processing efficiency, small processing output, inability to produce continuously, and inability to form automatic assembly line operations, and only one-sided or double-sided polishing can be performed on the workpiece, and it cannot be polished in all directions, so the polishing effect of the traditional method is not ideal. , The polishing quality is unstable. If a si...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C04B35/10C04B35/622
Inventor 徐金发
Owner HUZHOU XING XING ABRASIVE
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products