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Etching cleaning equipment and etching cleaning technology

A technology for cleaning tanks and etching tanks, applied in cleaning methods and utensils, sustainable manufacturing/processing, cleaning methods using liquids, etc., to achieve the effects of reducing movement frequency, enhancing capabilities, and reducing fragmentation rates

Active Publication Date: 2013-02-13
盐城天合国能光伏科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] In order to overcome the above defects, the technical problem to be solved in the present invention is to provide a method for testing the VA content in EVA for the existing obvious defects.

Method used

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  • Etching cleaning equipment and etching cleaning technology
  • Etching cleaning equipment and etching cleaning technology
  • Etching cleaning equipment and etching cleaning technology

Examples

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Effect test

Embodiment 1

[0009] An etching and cleaning equipment with three chemical tanks, three DI-water washing tanks and an air-drying chamber, the three chemical tanks are hydrofluoric acid / nitric acid etching tank, potassium hydroxide etching tank and hydrogen fluoride Acid / hydrochloric acid cleaning tank, characterized in that: three chemical tanks and three washing tanks are arranged sequentially as hydrofluoric acid / nitric acid etching tank, DI-water washing tank 1, potassium hydroxide cleaning tank, DI-water washing tank Tank 2, hydrofluoric acid / hydrochloric acid cleaning tank and DI-water washing tank 3, a water inlet pipe is connected to DI-water washing tank 3, and a constant temperature control heater is arranged on the water inlet pipe, and DI-water washing tank 1, DI- There is a water pipe connection between the water washing tank 2 and the DI-water washing tank 3 .

[0010] Using the etching cleaning process of the etching cleaning equipment, after the silicon wafer is etched in the...

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PUM

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Abstract

The invention relates to etching cleaning equipment and an etching cleaning technology in the photovoltaic industry. The etching cleaning equipment is provided with three chemicals slots, three DI-water rinsing baths and an air drying cabin, wherein the three chemicals slots are taken as a hydrofluoric acid / nitric acid etching slot, a potassium hydroxide etching slot and a hydrofluoric acid / hydrochloric acid etching slot respectively. The etching cleaning equipment and the etching cleaning technology can be used to solve the obvious defect problems of chippings and dark spots.

Description

technical field [0001] The invention relates to a silicon chip etching and cleaning process and equipment in the photovoltaic industry. Background technique [0002] figure 1 It is the original process flow chart of the texturing equipment. The wafer passes through each tank in turn according to the direction indicated in the figure, and finally is dried by the air knife in the air-drying tank, and the whole process ends. The black arrow shows the schematic diagram of the peripheral pure water in the equipment. It first enters the tank of RINSE3, overflows into RINSE2 when it is full, and flows into RINSE1 in the same way. And it is unstable, so when it comes to the dryer, it is difficult for the air knife to completely dry the film, resulting in tiny water droplets on the surface of some films, resulting in blue and black spots on the surface of some films after diffusion; due to the difficulty of drying, the air knife has to be moved The frequency is increased to 90%, th...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/00H01L31/18B08B3/08B08B3/10C23F1/08C23G3/00C30B33/10
CPCY02P70/50
Inventor 葛笑齐
Owner 盐城天合国能光伏科技有限公司