Multifunctional carbon dioxide cleaning machine

A carbon dioxide and multi-functional technology, applied in cleaning methods and appliances, chemical instruments and methods, and cleaning methods using gas flow, etc., can solve the problems of narrow application range of ultrasonic method, chemical cleaning and corrosion, and increased wastewater treatment costs. It achieves the effects of good environmental protection, wide range of cleaning and saving drying time

Inactive Publication Date: 2011-11-09
INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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  • Abstract
  • Description
  • Claims
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Problems solved by technology

However, high-pressure water cleaning requires a large amount of water resources, and the cleaning cycle is long and requires downtime; chemical cleaning has a corrosi

Method used

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  • Multifunctional carbon dioxide cleaning machine
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Embodiment Construction

[0038] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with specific embodiments and with reference to the accompanying drawings.

[0039] like figure 1 as shown, figure 1 The structure schematic diagram of this carbon dioxide multifunctional cleaning machine provided for the present invention, this multifunctional cleaning machine comprises:

[0040] Screen cloth 20 is equipped with on the cabinet 29 tops, and adjustable vibrator 23 is housed on the hopper shape ice storage tank 22 that stores dry ice in the cabinet 29, prevents the low temperature of dry ice from causing freezing when working for a long time, guarantees the normal blanking of dry ice. The ice storage tank 22 and the hollow interlayer of the flip cover 19 are equipped with thermal insulation materials to keep isolated from the ambient temperature and prevent dry ice from volatilizin...

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Abstract

The invention discloses a multifunctional carbon dioxide cleaning machine. The cleaning machine comprises an ice storage tank and a gas storage tank, wherein, the ice storage tank is equipped with an adjustable vibrator, and an upper flow baffle is arranged at an outlet of the ice storage tank and is connected with an adjustable speed rotary valve; the lower side of the rotary valve is equipped with a lower flow baffle, and an outlet of a hopper is connected with a Venturi tube fixed on the bottom of a case; a solenoid valve is arranged in a gas inlet pipeline of the Venturi tube and is connected with an outlet of a dry filter, an inlet of the dry filter is connected with a stop valve, and compressed air enters the dry filter via the stop valve and then enters the Venturi tube via the solenoid valve; an outlet of the Venturi tube is fixed on the bottom of the case, an insulating hose is connected with an outlet outside the case, and a spray gun is arranged on the front end of the hose and is connected with a nozzle through a rotatable joint; and a high-power electric heating wire is arranged outside the gas storage tank. The multifunctional carbon dioxide cleaning machine has the advantages of good on-line cleaning effect, high operating efficiency, no damage on the cleaning surface and no pollution, and is convenient for operation.

Description

technical field [0001] The invention relates to the technical field of precision instrument cleaning / semiconductor cleaning equipment, in particular to a carbon dioxide multifunctional cleaning machine. Background technique [0002] Mechanical equipment, electrical appliances, instruments, and semiconductor devices in the semiconductor industry are easily polluted. For example: after the circuit board is soldered, there are corrosive residues, particles on the surface of the silicon wafer, particles deposited on the wall of the CVD process chamber, etc. These contaminations are unavoidable, so cleaning contaminated surfaces is an important task. In the past, the cleaning of contaminated surfaces mainly used manual cleaning, dry sandblasting, high-pressure water cleaning, chemical cleaning, ultrasonic method, etc. However, high-pressure water cleaning requires a large amount of water resources, and the cleaning cycle is long and requires downtime; chemical cleaning has a co...

Claims

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Application Information

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IPC IPC(8): B08B5/02
Inventor 景玉鹏王磊
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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