A preparation method of nano-slit array of electron emission source of SED display
An electron emission source and electron emission technology, applied in the manufacture of discharge tubes/lamps, electrode system manufacturing, circuits, etc., can solve the problems of crack uncertainty, cracks on the surface of electron emission films, etc., and achieve accurate and controllable crack positions , to ensure the effect of uniformity
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[0031] The present invention will be described in further detail below in conjunction with the accompanying drawings.
[0032] A preparation method of an SED display electron emission source nano-slit array, comprising the following steps:
[0033] The first step is to manufacture a SED electron emission source pattern structure including a laser photoexpandable polymer material layer: a layer of laser photoexpandable polymer material is introduced between the transparent substrate and the electron emission material film with a stress concentration gap, Form a sandwich structure of "transparent substrate-laser photo-expandable polymer material-electron emission material". The laser photo-expandable polymer material adopts PMMA, PS or PI, which can have volume expansion characteristics under laser beam irradiation.
[0034] The introduction method of laser photoexpandable polymer material in the electron emission source pattern structure is divided into the overall introduction...
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