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A kind of low temperature preparation method of tiof2 photocatalytic film and its application

A photocatalytic film and low-temperature technology, which is applied in chemical instruments and methods, physical/chemical process catalysts, chemical/physical processes, etc., can solve the problems of inconvenient production and use, difficult to form a stable film on the surface of the substrate, etc., to achieve The effect of strong interaction, good stability and wide application prospects

Active Publication Date: 2011-12-28
上海万铭环保科技股份有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This method requires high-temperature roasting, which brings great inconvenience to actual production and use.
However, in the ordinary low-temperature dipping method, there is no chemical interaction between the substrate and the coating solution, and it is difficult to form a stable film on the surface of the substrate.

Method used

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  • A kind of low temperature preparation method of tiof2 photocatalytic film and its application
  • A kind of low temperature preparation method of tiof2 photocatalytic film and its application
  • A kind of low temperature preparation method of tiof2 photocatalytic film and its application

Examples

Experimental program
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Effect test

Embodiment 1

[0018] Add 0.37 g of titanium tetrafluoride to 30 mL of absolute ethanol, and stir at 283 K for 2 h to obtain solution A. Immerse the glass substrate in solution A, then lift it up slowly, remove the excess bottom solution and transfer it to a 373K oven for aging for 8 hours to prepare the photocatalytic film Ti-0.1-100. The obtained photocatalytic film was directly applied to the photocatalytic degradation reaction of Rhodamine B.

Embodiment 2

[0020] Add 1.5 g of titanium tetrafluoride to 60 mL of anhydrous butanol, and stir at 298 K for 5 h to obtain solution A. Immerse the glass substrate in solution A, then lift it up slowly, remove the excess bottom solution and transfer it to a 373K oven for aging for 8 hours to prepare the photocatalytic film Ti-0.2-100. The obtained photocatalytic film was directly applied to the photocatalytic degradation reaction of Rhodamine B.

Embodiment 3

[0022] Add 1.12 g of titanium tetrafluoride to 30 mL of absolute ethanol, and stir at 323 K for 1 h to obtain solution A. Immerse the glass substrate in solution A, then lift it up slowly, remove the excess bottom solution and transfer it to a 373K oven for aging for 8 hours to prepare the photocatalytic film Ti-0.3-100. The obtained photocatalytic film was directly applied to the photocatalytic degradation reaction of Rhodamine B.

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Abstract

The invention discloses a low temperature preparation method for a TiOF2 photocatalyst film. The method comprises the following steps: 1) adding proper amount of titanium tetrafluoride to an organic solvent to prepare a solution A; strongly stirring the solution A for 1-5 hours at a temperature of 283-323 K temperature to obtain a clear precursor solution; 2) dipping and coating the precursor solution on a substrate of glass or ceramic, such that the precursor solution reacts with the substrate; baking for 8-24 hours at the temperature of 313-433 K to obtain the TiOF2 photocatalyst film product. With the present invention, the TiOF2 film is uniformly generated on the surface of the glass or the ceramic through the chemical reactions; the interaction between the film and the substrate is strong, the formed film has good stability, such that the disadvantages of difficulty in forming the stable film on the substrate of the glass or the ceramic at the temperature of 373 K or the requirement of the follow-up baking in the traditional sol-gel method are overcome; the prepared film through the method has wide application prospects in degradation of rhodamine B solution through liquid-phase photocatalysis and air purification.

Description

technical field [0001] The present invention relates to a TiOF 2 A low-temperature preparation method for photocatalytic thin films, specifically relating to a method for uniform electroless plating of TiOF on glass and ceramic substrates at low temperatures 2 method for photocatalytic thin films. and applications of such photocatalysts. Background technique [0002] In recent years, the use of semiconductor photocatalysts to deal with various environmental pollution has attracted the attention of researchers all over the world. Photocatalysts are of great significance in the degradation of organic pollutants and air purification. With the deepening and expansion of research, how to coat photocatalysts on the surface of various substrates has become a bottleneck restricting the wide application of photocatalytic technology. The commonly used coating method is the sol-gel method. This method requires high-temperature roasting, which brings great inconvenience to actual p...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01J27/135A62D3/30A62D101/20
Inventor 朱建吕伏建卞振锋曹锋雷王金果李和兴
Owner 上海万铭环保科技股份有限公司
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