Method for collection of hexachlorodisilane and plant for the method

A technology of hexachlorodisilane and recovery method, applied in halosilanes, separation methods, chemical instruments and methods, etc., can solve problems such as hindering continuous operation of equipment, pipe blockage, etc., so as to improve operation efficiency and economic efficiency, and prevent blockage. , the effect of enhancing cooling efficiency

Active Publication Date: 2012-02-29
DENKA CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0015] However, high boiling point substances such as hexachlorodisilane adhere to the pipe wall in the equipment and clog the pipe, which may hinder the continuous operation of the equipment.

Method used

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  • Method for collection of hexachlorodisilane and plant for the method
  • Method for collection of hexachlorodisilane and plant for the method
  • Method for collection of hexachlorodisilane and plant for the method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0107] use figure 1 The apparatus shown produces trichlorosilane and recovers hexachlorodisilane as a by-product.

[0108] The evaporator was adjusted so that the internal temperature reached 100° C. and the internal pressure reached 0.1 MPa (absolute pressure), and tetrachlorosilane was continuously evaporated.

[0109] Vaporized tetrachlorosilane and hydrogen were mixed at a molar ratio of 1:2, preheated to 600° C. by a preheater, and continuously supplied to the reaction furnace at a flow rate of 27 moles / hour.

[0110] The reaction furnace was heated so that the center temperature of the reaction vessel accommodated therein was maintained at 1300°C.

[0111] The reaction generated gas generated in the reaction furnace is exported to the quench tower, and under the conditions of 0.1l / min and spray pressure at the spray rate, the mixture of trichlorosilane and tetrachlorosilane (moles) is sprayed in the quench tower in the quench tower. Ratio = 85:15) composed of cooling l...

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Abstract

Disclosed is a method for collecting hexachlorodisilane which is produced as a by-product in the production of trichlorosilane from tetrachlorosilane and hydrogen. The method comprises the steps of: reacting a raw material gas composed of vaporized trichlorosilane and hydrogen at a temperature ranging from 700 to 1400 DEG C to yield a reaction product gas; cooling the reaction product gas to a temperature ranging from 30 to 60 DEG C to yield a cooled condensate solution containing hexachlorodisilane; and concentrating and collecting a high-boiling-point material containing hexachlorodisilane from the cooled condensate solution.

Description

technical field [0001] The present invention relates to hexachlorodisilane (Si 2 Cl 6 ) recovery method, and equipment for the method. Background technique [0002] Trichlorosilane (SiHCl 3 ) is a special material gas used in the manufacture of semiconductors, liquid crystal panels, solar cells, etc. In recent years, the demand has gradually increased, and its future development as a CVD material widely used in the electronic field is expected. [0003] Trichlorosilane is obtained by making gasified tetrachlorosilane and hydrogen (H 2 ) are contacted in the reaction furnace to achieve the following thermal equilibrium state. [0004] [0005] The above reaction is carried out by heating the raw material gas composed of vaporized tetrachlorosilane and hydrogen to 700-1400° C. in a reaction furnace. [0006] In addition, at this time, in addition to the above reaction, the following equilibrium reaction occurs, thereby generating monochlorosilane (SiH 3 Cl), dichloro...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B33/107
CPCB01D53/002B01D2251/202B01D2257/204B01D2257/553C01B33/107C01B33/1071C01B33/10773B01D1/16B01D9/04B01J19/24
Inventor 松尾靖史竹村晃一杉村真
Owner DENKA CO LTD
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