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High delivery temperature isopipe materials

A technology of isopipe and refractory materials, used in manufacturing tools, glass manufacturing equipment, glass molding, etc., can solve problems such as obstacles

Inactive Publication Date: 2014-05-07
CORNING INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

As a result, existing technology presents a significant impediment to meeting the needs of flat panel display manufacturers for larger substrates

Method used

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  • High delivery temperature isopipe materials
  • High delivery temperature isopipe materials
  • High delivery temperature isopipe materials

Examples

Experimental program
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Embodiment 1

[0079] The silicon nitride isopipe is manufactured by pressing and firing a green body composed of silicon nitride powder and a sintering aid of less than 10% by weight in a nitrogen atmosphere. The length of the fired green body is greater than 1.5 meters, the height is greater than 0.25 meters, and the depth is greater than 0.1 meters. The fired green body is machined into an isopipe structure. The machined isopipe was installed in a fusion machine and heated to 1200°C in air. The isopipe was held at this temperature for 24 hours, during which time a silicon dioxide layer formed on the machined surface which essentially exhibited only passive oxidation mechanisms.

[0080] The isopipe is then used in the fusion process to create the glass ribbon, which is then cut into glass sheets that, after finishing, are used as substrates for liquid crystal displays. At elevated temperatures, the molten glass remains in contact with the isopipe for extended periods of time. The surfa...

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Abstract

Isopipes (13) for making a glass or a glass-ceramic using a fusion process are provided. The isopipes are made from a silicon nitride refractory material that is: (a) produced in block form in an atmosphere having a pO2 of less than 0.1 using less than 10 weight percent of one or more sintering aids, (b) machined into an isopipe configuration, and (c) exposed to a partial pressure of oxygen equal to or greater than 0.1 for a period of time and at a temperature sufficient to form a SiO2 layer (31) which exhibits substantially only a passive oxidation mechanism. The SiO2 layer (31) serves as a protective barrier for further oxidation of the silicon nitride during use of the isopipe (13). The isopipes (13) exhibit less sag during use than isopipes composed of zircon.

Description

[0001] This application claims priority to US Patent Application Serial No. 12 / 391750, filed February 24, 2009. technical field [0002] This invention relates to isopipes for manufacturing glass sheets by the fusion process and, in particular, to techniques for reducing the sagging of said isopipes during use. [0003] definition [0004] In the specification and claims, the term "isopipe" means a body suitable for construction as a glass-forming structure in a fusion downdraw process, regardless of the specific shape and configuration of said body, or whether the forming of the body involves Isobaric pressing. [0005] In the description and claims, the term "silicon nitride material" means a refractory material comprising at least 34% by weight of N and at least 51% by weight of Si. Background technique [0006] A. Glass substrates for flat panel displays [0007] Manufacturers of flat panel displays, such as liquid crystal displays (LCDs), use glass substrates to manu...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C03B17/06C04B35/586
CPCC03B17/064C04B2235/3217C04B2235/77C04B2235/6584C04B2235/94C04B2235/3418C04B2235/3225C04B2235/9607C04B2235/96C04B41/87C04B35/593C04B41/009C04B41/5035Y02P40/57C04B41/0072C04B41/4519C04B41/4556C04B35/584C03B17/06C04B35/82
Inventor J·J·麦金托什
Owner CORNING INC