Double-workpiece-platform same-phase rotation exchange method based on parallel connection mechanisms, and device thereof

Abstract

The invention relates to a double-workpiece-platform same-phase rotation exchange method based on parallel mechanisms, and a device of the method, belonging to a technology of semiconductor manufacturing equipment. The device comprises two workpiece platforms, a rotary transfer platform and the two parallel anti-rotation mechanisms; in the rotating exchange process of the two workpiece platforms,the two workpiece platforms are caught and blocked by the rotary transfer platform which rotates around the center of a base station, so that the exchange between an exposure station and a pretreatment station can be realized; and the rotation of the two workpiece platforms can be controlled by the parallel anti-rotation mechanisms, so that the two workpiece platforms can be ensured to have the same phase in the exchange process. The invention solves the problems that the existing scheme for exchanging the platforms in a linear way is high in impact torque and more in platform exchange beats,the existing scheme for exchanging the platforms in a rotating way is reverse in phases of the two workpiece platforms, cables are wound, a target of a laser interferometer is lost, and the like; a smaller mass balance system is adopted, so that the balance time is better shortened, the system is simplified, the cost is reduced, the platform exchange beats are reduced, the time for exchanging theplatforms can be reduced, and the yield of a photoetching machine is effectively improved.

Description

technical field [0001] The invention belongs to the technical field of semiconductor manufacturing equipment, and mainly relates to a method and device for in-phase rotation and exchange of double workpiece tables based on a parallel mechanism. Background technique [0002] Lithography machine is one of the important ultra-precision equipment in the manufacture of very large scale integrated circuits. The resolution and engraving accuracy of the lithography machine determine the minimum line width of the integrated circuit chip. At the same time, the yield of the lithography machine greatly affects the production cost of the integrated circuit chip. As the key subsystem of the lithography machine, the workpiece table It also determines the resolution, overlay accuracy and productivity of the lithography machine to a large extent. [0003] Productivity is one of the main goals of lithography machine development. Under the condition of satisfying the resolution and overlay a...

AI Technical Summary

Problems solved by technology

At the same time, it solves the problems of phase inversion of workpiece table, cable winding of workpiece table and target loss of laser interferometer, etc.

The present invention solves the problems of large impact torque and many beats in the existing linear channel change scheme, adopts a smaller mass balance system, which is beneficial to shorten the balance time, simplifies the system at the same time, reduces costs, reduces the cycle time of channel change and shortens the change of channels time, effectively improving the productivity of the lithography machine

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