Heat treatment method for target material
A heat treatment method and technology of a heat treatment device, which are applied in the field of semiconductor manufacturing, can solve problems such as uneven organizational structure and poor effect, and achieve the effects of uniform organizational structure, shortening heat treatment time, and increasing mass production speed
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
example
[0056] The following takes 4N5 or 5N copper-phosphorus alloy target as an example to illustrate the process steps and results of heat treatment in the target heat treatment method of the present invention:
[0057] (1) Provide copper-phosphorus alloy targets after plastic deformation process. The copper-phosphorus alloy target material through the plastic deformation process has a structure with a better grain size.
[0058] (2) Preheat the sand to 700°C in a constant temperature furnace. What described sand adopts is No. 45 silicon carbide (45#SiC).
[0059] (3) Submerging the copper-phosphorus alloy target into the preheated sand in the constant temperature furnace, so that the periphery of the copper-phosphorus alloy target is covered by the sand.
[0060] (4) Heat treatment of the copper-phosphorus alloy target. Specifically include: the heating temperature is 750°C, and the temperature is kept at this temperature for 60 minutes.
[0061] (5) Rough machining of the hea...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com