Method for manufacturing convex-surface double-blazed grating
A technology of a blazed grating and a manufacturing method, which is applied in the field of preparation of diffractive optical elements, can solve problems such as large difficulties, and achieve the effect of realizing the blaze angle
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Embodiment 1
[0083] Example 1: Please refer to Figure 7 , Figure 7 It is a schematic diagram of the effects corresponding to each step in the first embodiment of the present invention. A method for making a convex double-blazed grating with a grating period of 5 microns and two blaze angles of 4° and 8° respectively, wherein the diameter of the convex substrate is 35 mm; the radius of curvature is 75 mm, using interference exposure and ion beam etching and oblique ion beam scanning etching, and the manufactured A and B homogeneous gratings are rectangular gratings, and the duty ratio f=a / Λ=0.5. Include the following steps:
[0084] (1) Coating a photoresist 11 with a thickness of 500 nm on the substrate 10 .
[0085] (2) Perform interference lithography on the photoresist 11 to fabricate the photoresist grating 12 .
[0086] (3) block the B grating area, on the A grating area, use the photoresist grating 12 as a mask, carry out forward ion beam etching to the substrate, transfer the ...
Embodiment 2
[0092] Example 2: Please refer to Figure 8 , Figure 8 It is a schematic diagram of the effects corresponding to each step in the second embodiment of the present invention. A method for making a convex double blazed grating with a grating period of 500 nanometers and two blaze angles of 15° and 25° respectively, wherein the diameter of the convex substrate is 40 mm; the radius of curvature is 80 mm, using interference exposure and ion beam etching and oblique ion beam scanning etching, the A and B homogeneous gratings produced are both trapezoidal gratings, the trapezoidal angle β is 70°, and the duty ratio f=a / Λ=0.5. Include the following steps:
[0093] (1) Coating a photoresist 21 with a thickness of 300 nm on the substrate 20 .
[0094] (2) Perform interference lithography to fabricate a photoresist grating 22 .
[0095] (3) block the B grating area, on the A grating area, use the photoresist grating 22 as a mask, carry out forward ion beam etching to the substrate, ...
Embodiment 3
[0101] Example 3: Please refer to Figure 9 , Figure 9 It is a schematic diagram of the effects corresponding to each step in the third embodiment of the present invention. A method of making a convex double blazed grating with a grating period of 3000 nanometers and two blaze angles of 10° and 20° respectively, wherein the diameter of the convex substrate is 50 mm; the radius of curvature is 100 mm, using interference exposure and ion beam etching and oblique ion beam scanning etch to realize, the A and B two kinds of homogeneous gratings produced are trapezoidal gratings, the duty ratio f=a / Λ=0.5, the trapezoidal angle β of the A grating area is 85°, and the B grating area is trapezoidal The angle β is 75°. Include the following steps:
[0102] (1) Coating a photoresist 31 with a thickness of 600 nm on the substrate 30 .
[0103] (2) Perform interference photolithography to fabricate a photoresist grating 32 .
[0104] (3) Block the B grating area, on the A grating are...
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Abstract
Description
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