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Method for manufacturing convex-surface double-blazed grating

A technology of a blazed grating and a manufacturing method, which is applied in the field of preparation of diffractive optical elements, can solve problems such as large difficulties, and achieve the effect of realizing the blaze angle

Inactive Publication Date: 2012-07-04
SUZHOU UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

For holographic ion beam etching, since the blaze angle depends on the groove shape of the photoresist grating mask, it is more difficult to realize the blazed grating structure on the convex substrate

Method used

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  • Method for manufacturing convex-surface double-blazed grating
  • Method for manufacturing convex-surface double-blazed grating
  • Method for manufacturing convex-surface double-blazed grating

Examples

Experimental program
Comparison scheme
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Embodiment 1

[0083] Example 1: Please refer to Figure 7 , Figure 7 It is a schematic diagram of the effects corresponding to each step in the first embodiment of the present invention. A method for making a convex double-blazed grating with a grating period of 5 microns and two blaze angles of 4° and 8° respectively, wherein the diameter of the convex substrate is 35 mm; the radius of curvature is 75 mm, using interference exposure and ion beam etching and oblique ion beam scanning etching, and the manufactured A and B homogeneous gratings are rectangular gratings, and the duty ratio f=a / Λ=0.5. Include the following steps:

[0084] (1) Coating a photoresist 11 with a thickness of 500 nm on the substrate 10 .

[0085] (2) Perform interference lithography on the photoresist 11 to fabricate the photoresist grating 12 .

[0086] (3) block the B grating area, on the A grating area, use the photoresist grating 12 as a mask, carry out forward ion beam etching to the substrate, transfer the ...

Embodiment 2

[0092] Example 2: Please refer to Figure 8 , Figure 8 It is a schematic diagram of the effects corresponding to each step in the second embodiment of the present invention. A method for making a convex double blazed grating with a grating period of 500 nanometers and two blaze angles of 15° and 25° respectively, wherein the diameter of the convex substrate is 40 mm; the radius of curvature is 80 mm, using interference exposure and ion beam etching and oblique ion beam scanning etching, the A and B homogeneous gratings produced are both trapezoidal gratings, the trapezoidal angle β is 70°, and the duty ratio f=a / Λ=0.5. Include the following steps:

[0093] (1) Coating a photoresist 21 with a thickness of 300 nm on the substrate 20 .

[0094] (2) Perform interference lithography to fabricate a photoresist grating 22 .

[0095] (3) block the B grating area, on the A grating area, use the photoresist grating 22 as a mask, carry out forward ion beam etching to the substrate, ...

Embodiment 3

[0101] Example 3: Please refer to Figure 9 , Figure 9 It is a schematic diagram of the effects corresponding to each step in the third embodiment of the present invention. A method of making a convex double blazed grating with a grating period of 3000 nanometers and two blaze angles of 10° and 20° respectively, wherein the diameter of the convex substrate is 50 mm; the radius of curvature is 100 mm, using interference exposure and ion beam etching and oblique ion beam scanning etch to realize, the A and B two kinds of homogeneous gratings produced are trapezoidal gratings, the duty ratio f=a / Λ=0.5, the trapezoidal angle β of the A grating area is 85°, and the B grating area is trapezoidal The angle β is 75°. Include the following steps:

[0102] (1) Coating a photoresist 31 with a thickness of 600 nm on the substrate 30 .

[0103] (2) Perform interference photolithography to fabricate a photoresist grating 32 .

[0104] (3) Block the B grating area, on the A grating are...

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Abstract

The invention discloses a method for manufacturing a convex-surface double-blazed grating. Two blazed angels of the convex-surface double-blazed grating are a blazed angle A and a blazed angle B, two kinds of homogeneous gratings A and B are manufactured on a substrate and are taken as masks for spherical rotating slant Ar ion beam scan etching, and the required blazed gratings A and B are obtained. When the homogeneous gratings are manufactured, the trench depth of the homogeneous gratings can be accurately controlled by controlling the time of forward ion beam etching; and moreover, the homogeneous grating masks and the substrate are made of the same material, and the etching rates of the masks and the substrate are always kept consistent, so the blazed angles can be accurately controlled.

Description

technical field [0001] The invention relates to a preparation method of a diffractive optical element, in particular to a preparation method of a convex double blazed grating. Background technique [0002] Grating is a very widely used and important high-resolution dispersive optical element, which occupies a very important position in modern optical instruments. [0003] As we all know, the principal maximum direction of diffraction by a single grating is actually not only the geometrical optics propagation direction of light, but also the zero-order direction of the entire multi-slit grating. It concentrates light energy, but cannot separate various wavelengths. In practical applications, Focus on concentrating as much light energy as possible on a specific order. For this reason, it is necessary to make the diffraction grating into a groove shape determined by calculation, so that the main maximum direction of the diffraction of a single grating groove (or the direction ...

Claims

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Application Information

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IPC IPC(8): G02B5/18G03F7/00
Inventor 刘全吴建宏陈明辉
Owner SUZHOU UNIV