Method for producing nano fluorescent powder-free gallium nitride white light-emitting diode
A light-emitting diode, phosphor-free technology, applied to electrical components, circuits, semiconductor devices, etc., can solve the problems of reducing Droop effect and increasing luminous efficiency
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment
[0027] see figure 1 As shown in -6, the present invention provides a method for making a nano-phosphor gallium nitride white light-emitting diode, comprising the following steps:
[0028] Step 1: Take a substrate 10, which is sapphire and has a thickness of 400um.
[0029] Step 2: GaN buffer layer 11 and n-GaN layer 12 are epitaxially grown on the substrate 10, the thicknesses of GaN buffer layer 11 and n-GaN layer 12 are 2um and 3um respectively.
[0030] Step 3: Fabricate a GaN nanowire template on the n-GaN layer 12 by nanotechnology. The size of the nano-pattern template is 100nm, and the depth is 500nm.
[0031] Step 4: growing a GaN transition layer 13 on the GaN nanowire template. The thickness of the GaN transition layer 13 is 20 nm.
[0032] Step 5: growing the InGaN quantum disk 14 on the GaN transition layer 14 . The InGaN quantum disk 14 is 5 groups of InGaN / GaN, and the variation of the In composition is 0.15-0.3.
[0033] Step 6: growing a p-GaN layer 15 o...
PUM
Property | Measurement | Unit |
---|---|---|
size | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com