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Electron beam curable composition for curing in a vacuum chamber

A technology of composition and electron beam radiation, applied in the direction of surface coating liquid devices, coatings, polyurea/polyurethane coatings, etc., can solve problems such as loss of stability

Active Publication Date: 2012-09-12
METALLIZED SURFACE TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Addition of even small amounts of acrylate functionality rapidly leads to loss of stability

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0012] The invention is first practiced by forming a liquid phase composition comprising one or more components, all of which do not become a gas or vapor phase under said vacuum conditions. First the composition includes ethylenically unsaturated components. The ethylenically unsaturated component is an ethylenically unsaturated methacrylate monomer, or a mixture of an ethylenically unsaturated methacrylate monomer and an ethylenically unsaturated methacrylate oligomer. The ethylenically unsaturated component is polymerizable or crosslinkable by utilizing sufficient electron beam radiation. Importantly, the composition is substantially free of ethylenically unsaturated acrylate components, polymerization initiators, and solvents.

[0013] Suitable ethylenically unsaturated methacrylate monomers include but are not limited to primary or polyol methacrylates such as methyl methacrylate, ethyl methacrylate, propyl methacrylate, butyl methacrylate ester, hydroxyethyl methacryla...

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PUM

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Abstract

A liquid composition and a process for coating the composition onto a surface of a substrate in a substantially oxygen-free atmosphere, under vacuum conditions. The composition comprises one or more components, all of which components do not go into a gas or vapor phase under the vacuum conditions. The composition has an ethylenically unsaturated component composed of an ethylenically unsaturated methacrylate monomer, or a combination of an ethylenically unsaturated methacrylate monomer and an ethylenically unsaturated methacrylate oligomer. The ethylenically unsaturated component is polymerizable or crosslinkable by the application of sufficient electron beam radiation. The composition is substantially absent of ethylenically unsaturated acrylate components, substantially absent of polymerization initiators, and substantially absent of solvents.; The composition optionally further comprises one or more polymers without an acrylate functional group and without a methacrylate functional group. The composition optionally further comprises one or more of waxes, pigments, and / or wetting agents.

Description

technical field [0001] The present invention relates to a composition and method for producing thin, solid, polymeric films by liquid deposition on a substrate followed by electron beam curing. Both liquid deposition and curing are performed under vacuum conditions in substantially oxygen-free air. The composition includes one or more components, all of which do not enter the gas phase under vacuum conditions. The composition has an ethylenically unsaturated component consisting of an ethylenically unsaturated methacrylate monomer, or an ethylenically unsaturated methacrylate monomer and an ethylenically unsaturated methacrylic acid A mixture of ester oligomers. The ethylenically unsaturated component is polymerizable or crosslinkable by application of sufficient electron beam radiation. The composition is substantially free of ethylenically unsaturated acrylate components, polymerization initiators, and solvents. Background technique [0002] Applying protective and / or ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B05D3/00C09D4/02
CPCB05D1/28B05D3/0493B05D3/068B05D5/067B05D2201/02B05D2202/00B05D2350/65B05D2502/00C09D4/00C09D133/08C09D133/10C09D175/16
Inventor 米哈伊尔·拉克辛沃尔夫冈·德克尔萨布汉卡尔·查特吉
Owner METALLIZED SURFACE TECH
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