Linear evaporation source device and precise evaporation rate control evaporating unit with same

Abstract

The invention provides a linear evaporation source device for evaporating an evaporation source in a vacuum. The linear evaporation source device comprises a body, an insulating sleeve component, a heating wire and an evaporating cover. The body is provided with a containing trough with an upward opening. The insulating sleeve component is fixed inside the containing trough and comprises a first horizontal insulating sleeve row. The first horizontal insulating sleeve row comprises a plurality of first insulating sleeves projecting at intervals inside the containing trough at the same height. The heating wire is sequentially wound on the first insulating sleeves, and both ends of the heating wire are connected with an external power source electrically. The evaporating cover covers the body and forms a heating cavity with the containing trough. The evaporating cover is provided with holding sockets in one-to-one correspondence to the first insulating sleeves. The holding sockets penetrate through the evaporating cover to form evaporating holes. The linear evaporation source device is capable of forming a plurality of independent evaporation point sources, concentration of evaporated material is evener at any position, and accordingly excellent conditions are created for even coating of a substrate. In addition, the invention further discloses a precise evaporation rate control evaporating unit.

Description

technical field [0001] The present invention relates to an evaporation source device and evaporation equipment with the evaporation source device, in particular to a linear evaporation source device which is suitable for being arranged in a vacuum chamber in a vacuum environment to perform linear evaporation on the evaporation source and has the linear evaporation source The evaporation rate of the device is precisely controlled evaporation equipment. Background technique [0002] Thin sheets such as glass substrates have been widely used in the manufacture of LCD-TFT displays, organic light-emitting display device (OLED) panels, solar panels, and the like. In such applications, thin films are mostly deposited on clean glass. The process for such large glass substrates usually involves the implementation of multiple sequential steps, including chemical vapor deposition (CVD), physical vapor deposition (PVD), organic substances Evaporation, magnetron sputtering deposition or...

AI Technical Summary

Problems solved by technology

Since the concentration of the evaporating substance is arranged in a decreasing manner from the center of the evaporation source nozzle to both sides, the thickness of the coating layer at the part of the glass substrate facing the evaporation source nozzle is correspondingly thicker than that of other parts of the glass substrate , thus seriously affecting the uniformity of the coating layer of the glass substrate, and correspondingly affecting the quality and life of subsequent devices

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