Light emitting diode device and producing method thereof
一种发光二极管、制造方法的技术,应用在电气元件、电固体器件、电路等方向,能够解决效率不均匀、白色发光装置发出不均白色光等问题,达到提高取出效率、实现亮度、防止发光效率降低的效果
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[0161] A base substrate with a thickness of 1 mm was prepared, which was made of sapphire (Al 2 o 3 ) formed by laminating a conductor layer on the upper surface of an insulating substrate composed of copper, nickel and gold (refer to figure 1 (a)).
[0162] In addition, a support substrate with a thickness of 450 μm made of sapphire was prepared (see image 3 ). Next, a buffer layer made of GaN with a thickness of 30 nm, and a buffer layer made of N-type GaN (n-GaN:Si, similarly shown below) obtained by doping Si were sequentially formed on the support substrate in the above-mentioned pattern by epitaxial growth. A 5 μm N-type semiconductor layer, a 120-nm-thick light-emitting layer made of InGaN, and a 50-nm-thick P-type semiconductor layer made of p-GaN:Mg (refer to image 3 ).
[0163] Next, an electrode portion is formed on the upper surface of the photo-semiconductor layer so as to be connected to the photo-semiconductor layer by a patterning method (refer to imag...
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