Light-absorption transparent thin film of thin film solar cell
A technology of solar cells and transparent films, applied in the field of solar power generation, can solve the problem of waste of solar radiation energy, and achieve the effect of improving photoelectric conversion efficiency and reducing thermalization effect.
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Embodiment 1
[0014] Indium oxide doped with 0.5wt% Ce is used as the target material, and the film is coated by an intermediate frequency reaction vertical magnetron sputtering coating equipment.
[0015] Taking the silicon wafer as the substrate, the silicon wafer is firstly cleaned, dried and put into the coating chamber, and O2 with a purity of 99.99% is introduced, the flow rate is 150 sccm, the voltage is 800 V, the current is 25 A, and the substrate temperature is The temperature is 300°C, and the working pressure is 0.5Pa.
Embodiment 2
[0017] Indium oxide doped with 1.2wt% Ce was used as the target material, and the film was coated by an intermediate frequency reaction vertical magnetron sputtering coating equipment.
[0018] Taking the silicon wafer as the substrate, firstly clean the silicon wafer, dry it and put it into the coating chamber, feed O2 with a purity of 99.99%, the flow rate is 150 sccm, the voltage is 800 V, the current is 30 A, the substrate temperature The temperature is 450℃, and the working pressure is 0.5Pa.
Embodiment 3
[0020] Indium oxide doped with 0.8wt% Ce is used as the target material, and the film is coated by an intermediate frequency reaction vertical magnetron sputtering coating equipment.
[0021] Taking the silicon wafer as the substrate, firstly clean the silicon wafer, dry it and put it into the coating chamber, feed O2 with a purity of 99.99%, the flow rate is 150 sccm, the voltage is 800 V, the current is 30 A, the substrate temperature The temperature is 450℃, and the working pressure is 0.5Pa.
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