Multilayer conductive film with high work function, preparation method thereof and organic electroluminescent device
A high work function, conductive film technology, applied in the fields of electric solid device, semiconductor device, semiconductor/solid state device manufacturing, etc., can solve problems such as production limitations
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[0020] The preparation method of the above-mentioned high work function multilayer conductive film, such as figure 2 shown, including the following steps:
[0021] S1, the preparation of the target: the ZnO, SnO 2 and Sb 2 o 5 After the raw materials are mixed and ground, they are sintered at 900-1300°C to form an AZTO target; among them, ZnO:SnO 2 52:48 (mass percentage), Sb 2 o 5 0.5-5% (mass percentage) of the total amount; preferably, Sb 2 o 5 The mass percentage is 0.5%, and the sintering temperature is 1200°C; the CuSn target is obtained by purchasing, and the purity is 99.999%; ZnO, SnO 2 and Sb 2 o 5 The purity is 99.999%;
[0022] S2, AZTO target material, CuSn target material and substrate (such as, polyethylene terephthalate (PET), polycarbonate (PC), polyethylene naphthalate (PEN) in step S1 ), polyethersulfone (PES), etc.) into the vacuum chamber of the magnetron sputtering coating equipment, and use a mechanical pump and a molecular pump to pump the v...
Embodiment 1
[0031] Choose ZnO and SnO with a purity of 99.99% 2 , Sb 2 o 5 powder (wherein, ZnO: SnO 2 =52:48 (mass percentage)), that is, 51.74wt% of ZnO, 47.76wt% of SnO 2 , 0.5wt% Sb 2 o 5 ), were uniformly mixed, and sintered at 1200°C to form an AZTO target of Φ50×2mm, and put the AZTO target and CuSn target into the vacuum chamber of the magnetron sputtering coating equipment. Then, the polyethylene terephthalate (PET) substrate was ultrasonically cleaned with acetone, absolute ethanol and deionized water, dried with high-purity nitrogen, and placed in the vacuum chamber of the magnetron sputtering coating equipment. Set the distance between the center line of the AZTO target and the CuSn target to the polyethylene terephthalate (PET) substrate as 50mm. Use a mechanical pump and a molecular pump to evacuate the cavity to 6.0×10 -4 Pa, the argon gas with a working gas flow rate of 20sccm is introduced, the pressure is adjusted to 1.0Pa, and then the coating is started, and the...
Embodiment 2
[0034] Choose ZnO and SnO with a purity of 99.99% 2 , Sb 2 o 5 powder (wherein, ZnO: SnO 2 =52:48 (mass percentage)), that is, 49.96wt% of ZnO, 46.08wt% of SnO 2 , 4wt% Sb 2 o 5 ), were uniformly mixed, and sintered at 900°C to form an AZTO target of Φ50×2mm, and put the AZTO target and CuSn target into the vacuum chamber of the magnetron sputtering coating equipment. Then, the polycarbonate (PC) substrate was ultrasonically cleaned with acetone, absolute ethanol and deionized water, dried with high-purity nitrogen, and placed in the vacuum chamber of the magnetron sputtering coating equipment. Set the distance between the center line of the AZTO target and the CuSn target to the polycarbonate (PC) substrate as 50mm. Use a mechanical pump and a molecular pump to evacuate the vacuum of the chamber to 1.0×10 -3 Pa, the argon gas with a working gas flow rate of 15 sccm is introduced, the pressure is adjusted to 2.0 Pa, and then the coating is started, and the sputtering po...
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