Control technological method for planeness of surface of LTCC substrate
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- 中国航天科工集团第二研究院二十三所
- Publication Date
- 2012-10-10
Abstract
Description
technical field
[0001] The invention relates to a process method for controlling the surface flatness, in particular to a process method for controlling the surface roughness of an LTCC substrate. Background technique
[0002] The LTCC (Low Temperature Co-fired Ceramic) process is used for the manufacture of high-density multilayer circuit substrates for three-dimensional space vertical wiring of miniaturized MCM microwave / millimeter wave modules / components. After the LTCC substrate is sintered and formed, its surface flatness will affect the microwave characteristics of the circuit, such as grounding performance, microwave loss, surface conductor adhesion, and subsequent assembly effects, especially the assembly of bare chips and the brazing of the substrate, which have very high requirements for flatness. High, this is because the unevenness of the substrate leads to a large solder void rate, which ultimately affects the grounding characteristics of the module. Factors af...