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Preparation method for reflection-deducting coating

An anti-reflection coating and coating technology, applied in coatings, optics, instruments, etc., can solve the problems of high production cost and inability to form a large-area film, and achieve the effects of reducing reflection, improving light transmission performance, and increasing transmission.

Inactive Publication Date: 2012-10-24
THE NAT CENT FOR NANOSCI & TECH NCNST OF CHINA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] Therefore, the object of the present invention is to overcome the disadvantages of high temperature and high vacuum reaction conditions, inability to form large-area films and high production costs in the existing antireflection coating preparation method, and provide a method that does not require high temperature and high vacuum. Reaction conditions, preparation method of anti-reflection coating capable of forming large-area film and low production cost

Method used

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  • Preparation method for reflection-deducting coating
  • Preparation method for reflection-deducting coating

Examples

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Effect test

Embodiment 1

[0037] This embodiment is used to illustrate the preparation method of the anti-reflection coating of the present invention and the detection of its adhesion.

[0038] To 99.9 g of propylene glycol methyl ether acetate was added 0.1 g of methacryloxysilane-modified silica nanoparticles (Degussa R7200, the primary particle size is 12nm, and the particle size of a single particle on the information given by the manufacturer is 12nm, but because the gas-phase nano-particles are generated by a high-temperature sintering method, they generally exist in micron-scale agglomerations), stirred at 500rpm to obtain a uniform slurry. Ultrasonic cell pulverizer was used to ultrasonically disperse the above slurry for 1 h, and the ultrasonic power was 1200W. Then, use a planetary ball mill to grind the slurry, the diameter of the grinding ball is 0.5mm, the rotation speed is 500rpm, and the grinding time is 12h to obtain a silica nano-dispersion.

[0039] Add 0.8 g of photoinitiator Irga...

Embodiment 2

[0043] This embodiment is used to illustrate the preparation method of the anti-reflection coating provided by the present invention.

[0044] Add 3 g of unmodified aluminum oxide nanoparticles (Degussa AluC, the particle size is 13nm), stirred evenly under 500rpm. Ultrasonic cell pulverizer was used to ultrasonically disperse the above slurry for 1 h, and the ultrasonic power was 1200w. Then, use a planetary ball mill to grind the slurry, the diameter of the grinding ball is 0.5 mm, the rotation speed is 500 rpm, and the grinding time is 12 hours to obtain a nano-dispersion of aluminum oxide.

[0045] The above nano-dispersion liquid was flow-coated on the PMMA substrate, the substrate was put into an oven, and baked at 80° C. for 0.5 h to obtain an anti-reflection coating.

[0046] On the other surface of the PMMA substrate, an antireflection coating was obtained in the same manner.

Embodiment 3

[0048] This embodiment is used to illustrate the preparation method of the anti-reflection coating provided by the present invention.

[0049] Add 0.3 g of acrylate DESMOPHEN A450 BA (Bayer) to 72 g of absolute ethanol and 24 g of propylene glycol methyl ether acetate, and stir evenly at 500 rpm. Then add 3 g unmodified silica nanoparticles (Degussa A200, the particle size is 12nm), stirred at 500rpm to obtain a uniform slurry. Then, ultrasonically disperse the above slurry for 1 h using an ultrasonic cell pulverizer with an ultrasonic power of 1200w to obtain a silica nano-dispersion. Add 0.066g thermal initiator DESMODUR N3390 BA / SN (Bayer) to the prepared silicon dioxide nano-dispersion liquid, stir at 500rpm to make it dissolve completely.

[0050] Use an inkjet printer (Fujifilm Dimatix Materials printer Dmp-2831) to spray the above solution on a PET substrate (substrate thickness is 0.188mm), put the substrate in an oven, and bake it at 80°C for 8h to obtain an anti-r...

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Abstract

The invention provides a preparation method for a reflection-deducting coating, the method comprises the following steps of: (1) preparing nano dispersion agent: SiO2 and / or Al2O3 nano particles are / is dispersed into a solvent to form the nano dispersion agent; and (2) preparing the coating: the nano dispersion agent is coated on a substrate to form the coating by curing. The method has the following advantages that the method is simple and feasible; a large area of film shaping on the coating can be realized; a remarkable attachment between the coating and the substrate can be realized; the method can be applied in wide substrate materials; and the prepared coating has the effects of effectively decreasing reflection and increasing transmission, and the performance of light transmission of the substrate is greatly increased by utilizing a double-face coating.

Description

technical field [0001] The invention relates to a method for preparing an anti-reflection coating, in particular to a method for preparing an anti-reflection coating based on nano-dispersion technology. Background technique [0002] When the light is incident on the surface of the material, it will often reflect. When the intensity of the reflected light is high, it will cause potential danger. For example, windows for cars and buildings will seriously interfere with the driving of the driver. Even if the reflectivity of the surface of the object is extremely low, in an optical system containing multiple optical elements, the loss of light energy due to light reflection cannot be ignored. In order to reduce the loss of light energy caused by reflection on the surface of the optical element, it is usually coated with an anti-reflection film on the surface, and the reflection of light is reduced by using the interference cancellation of the reflected light on the upper and low...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B1/11C09D1/00G02B1/115
Inventor 周凌云张辉张晖张忠
Owner THE NAT CENT FOR NANOSCI & TECH NCNST OF CHINA
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