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Non-volatile memory element and non-volatile memory device equipped with same

A non-volatile storage and component technology, which is applied in information storage, electrical components, static memory, etc., can solve the problems of fine-grained flash memory and achieve the effect of reducing the deviation of resistance value

Active Publication Date: 2012-11-14
PANASONIC SEMICON SOLUTIONS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] With regard to these requirements, it can be said that there is a limit to the refinement of flash memory (flash memory) using the existing floating gate (floating gate)

Method used

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  • Non-volatile memory element and non-volatile memory device equipped with same
  • Non-volatile memory element and non-volatile memory device equipped with same
  • Non-volatile memory element and non-volatile memory device equipped with same

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no. 1 approach )

[0055] [Structure of nonvolatile memory element]

[0056] figure 1 It is a cross-sectional view showing a configuration example of the nonvolatile memory element according to the first embodiment of the present invention.

[0057] Such as figure 1 As shown, the nonvolatile memory element 100 has: a substrate 101; an oxide layer 102 as an insulating layer formed on the substrate 101; a first electrode layer (first electrode) 103 formed on the oxide layer 102 ; the second electrode layer (second electrode) 105; and the variable resistance layer 104 sandwiched by the first electrode layer 103 and the second electrode layer 105 (by the first transition metal oxide layer 106 and the second transition metal oxide layer described later The stacked structure of the oxide layer 107).

[0058] When driving this nonvolatile memory element 100 , a voltage (electrical signal) satisfying a predetermined condition is applied between the first electrode layer 103 and the second electrode l...

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Abstract

Disclosed are: a non-volatile memory element in which the voltage of an electric pulse necessary for initial brake down can be reduced and the fluctuation in resistivity values can also be reduced; and a non-volatile memory device equipped with the non-volatile memory element. The non-volatile memory element comprises a first electrode (103), a second electrode (105), and a resistance-varying layer (104) which is intercalated between the first electrode (103) and the second electrode (105) and in which the resistivity value can vary reversibly depending on an electric signal delivered between the first electrode (103) and the second electrode (105), wherein the resistance-varying layer (104) comprises a first region (106) which is in contact with the first electrode (103) and contains an oxygen-deficient transition metal oxide and a second region (107); which is in contact with the second electrode (105) and contains a transition metal oxide having a smaller degree of oxygen deficiency than that of the first region (106). The second electrode (105) is composed of an alloy of iridium and at least one noble metal having a lower Young's modulus than that of iridium, and has an iridium content of 50 atm% or more.

Description

technical field [0001] The present invention relates to a variable resistance nonvolatile semiconductor memory element whose resistance value changes when a voltage pulse is applied, and a nonvolatile memory device having the same. Background technique [0002] In recent years, with the development of digital technology, electronic equipment such as portable information equipment and information home appliances have become more highly functional. Therefore, there is an increasing demand for increasing the capacity of the variable resistance element, reducing the writing power, increasing the writing / reading time, and extending the life. [0003] With respect to these requirements, it can be said that there is a limit to the refinement of flash memory (flash memory) using conventional floating gates (floating gate). On the other hand, in the case of a variable resistance element (variable resistance memory) using a variable resistance layer as a material of a memory portion,...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L27/105C23C14/06G11C13/00H01L45/00H01L49/00
CPCH01L27/2409H01L27/2481G11C2213/79H01L27/2436G11C2213/72H01L45/1253G11C13/0007H01L45/146H01L45/1625H01L45/08H01L45/1233H10B63/84H10B63/20H10B63/30H10N70/24H10N70/841H10N70/826H10N70/8833H10N70/026
Inventor 米田慎一三河巧早川幸夫二宫健生
Owner PANASONIC SEMICON SOLUTIONS CO LTD