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Visible light response type photocatalytic material of tantalum nitride modified by cobalt and preparation method thereof

A catalytic material and visible light technology, applied in the field of photocatalytic materials, can solve the problems of reduced catalyst activity and stability, and achieve the effects of good visible light responsiveness, low cost and simple process

Inactive Publication Date: 2012-11-21
ZHEJIANG GONGSHANG UNIVERSITY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] However, existing Ta 3 N 5 There is a self-oxidation problem while using sunlight to photolyze water, and some Ta 3 N 5 It will be oxidized under the action of photogenerated holes, which will reduce the activity and stability of the catalyst
Therefore, although many studies have been devoted to optimizing the structure and performance of tantalum nitride, it is still a challenge to improve the light conversion efficiency and stability of tantalum nitride semiconductors, and it is urgent to develop new stable visible light with higher activity. catalyst

Method used

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  • Visible light response type photocatalytic material of tantalum nitride modified by cobalt and preparation method thereof
  • Visible light response type photocatalytic material of tantalum nitride modified by cobalt and preparation method thereof
  • Visible light response type photocatalytic material of tantalum nitride modified by cobalt and preparation method thereof

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Embodiment 1

[0044] Pure tantalum foil (2cm*2cm) was ultrasonically cleaned with acetone, absolute ethanol and deionized water in sequence; 5 Dissolve in methanol, make the precursor solution A that concentration is 10mM; Co(NO 3 ) 2 Dissolve in methanol to prepare precursor solution B with a concentration of 10 mM. Pipette 30 μL of precursor solution A onto the tantalum foil and air-dry at room temperature. After repeating 9 times, pipette 30 μL of precursor solution B onto the tantalum foil and air-dry at room temperature. The dripped sample was put into a tube furnace, and was annealed at 850°C in an anhydrous ammonia atmosphere with a flow rate of 80mL / min for 2h to obtain Ta 0.9 co 0.1 N 1.5 film.

[0045] Figure 1a For Ta 3 N 5 and Ta 0.9 co 0.1 N 1.5 The linear scanning voltammetry curve of the film under the irradiation of ultraviolet and visible light; Figure 1b For Ta 3 N 5 and Ta 0.9 co 0.1 N 1.5 The linear scanning voltammetry curve of the thin film under visi...

Embodiment 2

[0047] Pure tantalum foil (2cm*2cm) was ultrasonically cleaned with acetone, absolute ethanol and deionized water in sequence; 5 Dissolve in methanol, make the precursor solution A that concentration is 10mM; Co(NO 3 ) 2 Dissolve in methanol to prepare precursor solution B with a concentration of 10mM. Pipette 30 μL of precursor solution A onto the tantalum foil, air-dry at room temperature, repeat 6 times, pipette 30 μL of precursor solution B onto the tantalum foil, repeat 4 times, and then air-dry at room temperature. The dripped sample was put into a tube furnace and annealed at 850 °C in an anhydrous ammonia atmosphere with a flow rate of 100 mL / min for 2 h to obtain Ta 0.6 co 0.4 N 1.1 film.

[0048] figure 2 For Ta 0.6 co 0.4 N 1.1 The GIXRD diagram of the film, given by figure 2 It can be seen that the main component of cobalt-modified tantalum nitride photocatalytic material is Ta 3 N 5 and Co 5.47 N, due to the use of tantalum foil as the substrate, am...

Embodiment 3

[0050] Pure tantalum foil (2cm*2cm) was ultrasonically cleaned with acetone, absolute ethanol and deionized water in sequence; 5 Dissolve in methanol, make the precursor solution A that concentration is 10mM; Co(NO 3 ) 2 Dissolve in methanol to prepare precursor solution B with a concentration of 10 mM. Pipette 30 μL of precursor solution A onto the tantalum foil, air-dry at room temperature, repeat 8 times, pipette 30 μL of precursor solution B onto the tantalum foil, repeat 2 times, and then air-dry at room temperature. The dripped sample was put into a tube furnace, and annealed at 800 °C in an anhydrous ammonia atmosphere with a flow rate of 100 mL / min for 4 h to obtain Ta 0.8 co 0.2 N 1.4 film.

[0051] Figure 4a for the same Ta 3 N 5 The linear scanning voltammetry curve repeated 3 times under the irradiation of ultraviolet-visible light; Figure 4b the same Ta 0.8 co 0.2 N 1.4 The linear scanning voltammetry curves of the film repeated three scans under the...

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Abstract

The invention discloses a visible light response type photocatalytic material of tantalum nitride modified by cobalt and a preparation method thereof. The preparation method includes cleanly washing a pure tantalum foil, using the pure tantalum foil as a substrate, dropping a precursor solution A containing Ta5+ onto the substrate, air drying at the room temperature to obtain a tantalum foil loaded with Ta5+, dropping a precursor solution B containing metal cobalt ions onto the tantalum foil loaded with Ta5+, air drying at the room temperature to obtain a tantalum foil loaded with Ta5+ and the metal cobalt ions, and subjecting the tantalum foil loaded with Ta5+ and the metal cobalt ions to a constant temperature calcination in a flowing anhydrous ammonia gas atmosphere to obtain the photocatalytic material. By means of the method, the prepared photocatalytic material has the advantages that the stability of Ta3N5 is effectively improved, the self oxidation of the Ta3N5 is inhibited, the electron transfer can be facilitated, the photoproduction electron-hole pair recombination is inhibited, and the photolysis efficiency is improved.

Description

technical field [0001] The invention relates to the technical field of photocatalytic materials, in particular to a cobalt-modified tantalum nitride photocatalytic material responsive to visible light and a preparation method thereof. Background technique [0002] In today's society, human beings are facing two severe problems of energy shortage and environmental pollution. Solar energy is a typical natural energy source. Using solar energy to photocatalytically split water to produce hydrogen has very important scientific value and far-reaching practical significance in alleviating the energy crisis and reducing environmental pollution. At present, the key to solar photocatalytic decomposition of water to produce hydrogen lies in the development and development of efficient and stable new visible light catalytic materials. [0003] Tantalum Nitride (Ta 3 N 5 ) as a good visible light-responsive photocatalytic material has the important conditions for photolysis of water ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01J27/24
Inventor 丛燕青李哲张轶王齐
Owner ZHEJIANG GONGSHANG UNIVERSITY
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