Method for manufacturing multistage micro-mirror through inversely adjusting thick film
A technology of micro-mirror and thick film, applied in the direction of mirrors, optics, instruments, etc., can solve the problems of small vertical spacing adjustment range of steps, difficult to meet optical instruments, rough surface, etc., and achieve low surface roughness, high flatness, The effect of improving the control precision
Active Publication Date: 2012-11-21
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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Problems solved by technology
[0004] The present invention aims to solve the technical problems of low precision, small step vertical spacing adjustment range, and rough surface in the multi-stage micro-reflectors produced in the prior art, and it is difficult to meet the requirements of optical instruments. It provides a step height, surface roughness, The horizontal precision, surface shape, etc. can be precisely controlled, and the method of making multi-level micro-mirrors by flip-chip adjustment of thick films
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[0030] The inventive idea of the method for making a multi-stage microreflector by thick-film flip-chip adjustment of the present invention is:
[0031] A method for making a multi-stage micro-reflector by thick-film flip-chip adjustment, comprising the following steps:
[0032] Step 1: forming film steps with the same marking pattern on multiple substrates by depositing film layers, and the heights of the film steps on adjacent substrates are incrementally increased. Specifically, the multiple substrates are firstly cleaned and polished so that at least a pair of sides of the rectangular substrates are parallel to each other, and the surface roughness reaches 0.1 nm˜1 μm. Then, on a plurality of substrates that have been cleaned and polished, film steps with different heights are formed by depositing film layers, and the film steps on adjacent substrates increase successively, and the increasing heights are the same.
[0033] Step 2: Form a plurality of strip-shaped film l...
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Abstract
The invention relates to a method for manufacturing a multistage micro-mirror through inversely adjusting a thick film. The method comprises the following steps of manufacturing 2N original substrates and washing the substrates; photoetching a needed mask pattern on the original substrates, depositing a film material, and stripping photoresist to form a film layer structure; photoetching a masked pattern on a base, and depositing a film layer which has a thickness less than h; respectively locating the first N inverse band structure substrates on a specific position of the base, and fixing the substrates together to form a multistage micro-mirror; and depositing a reflectance-increasing film layer on the upper surface of the multistage micro-mirror. By the method provided by the invention, control precision of a step surface roughness is effectively improved, and a step vertical height is monitored in real time, so that the precision of a transverse size is high, and the process controllability is strong.
Description
technical field [0001] The invention relates to a method for manufacturing a light reflection device, in particular to a method for making a multi-stage micro-mirror by flip chip adjustment of a thick film. Background technique [0002] With the development of optical systems in the direction of small size and compact structure, the miniaturization of devices in optical systems has become an important research topic in the design and manufacture of optical devices. The level of design and manufacture of micro-optical devices directly determines the performance of optical instruments. The multi-stage micromirror with multiple steps is a kind of light reflection device, which has more and more applications in optical systems, such as spectral analysis, beam shaping and fiber coupling. [0003] At present, the structure of multi-step micromirrors can be prepared by multiple photolithography and multiple (dry or wet) etching on quartz and other material substrates through binar...
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IPC IPC(8): G02B5/08G02B1/10
Inventor 梁静秋梁中翥郑莹
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI