Titanium-doped strontium thio-aluminate luminescent film, preparation method thereof, and organic electroluminescent device
A technology of luminescent thin film and thioaluminate, applied in luminescent materials, electrical components, semiconductor devices, etc.
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[0018] Step S1, preparation of ceramic target material: according to the general chemical formula SrAl 2-x S 4 :xTi +4 Stoichiometric ratio of each element, select SrS, Al 2 S 3 and TiS 2 The powder, after uniform mixing, is sintered at 900-1300°C (preferably 1100°C) in an inert gas atmosphere (such as argon, nitrogen), and naturally cooled to obtain a target sample, which is cut into diameters of 50mm target with a thickness of 2mm; wherein, the value of x ranges from 0.002 to 0.132; the preferred value of x is 0.044;
[0019] Step S2, put the target and substrate in step S1 into the vacuum chamber of the magnetron sputtering coating equipment, and use a mechanical pump and a molecular pump to pump the vacuum of the chamber to 1.0×10 -3 Pa~1.0×10 -5 Pa, preferably 5.0×10 -4 Pa;
[0020] Step S3, adjusting the magnetron sputtering coating process parameters as follows: the base-target distance is 45-90mm, preferably 60mm; the substrate temperature is 250°C-750°C, prefe...
Embodiment 1
[0026] 1. Select SrS and TiS with a purity of 99.99% respectively 2 and Al 2 S 3 Powder (wherein, the quality of SrS is 76g, TiS 2 The mass of 4g, Al 2 S 3 The mass is 120g), after uniform mixing, sintering at 1100°C under the protection of argon, and cooling naturally to obtain a target sample, which is cut into a target with a diameter of 50mm and a thickness of 2mm;
[0027] 2. Put the target into the vacuum chamber of the magnetron sputtering coating equipment;
[0028] 3. Clean the glass ultrasonically with acetone, absolute ethanol and deionized water successively, and perform oxygen plasma treatment on it, and then put it into the vacuum chamber of the magnetron sputtering coating equipment; among them, the distance between the target and the glass Set to 60mm;
[0029] 4. Use a mechanical pump and a molecular pump to pump the vacuum of the vacuum chamber of the magnetron sputtering coating equipment to 5.0×10 -4 Pa;
[0030]5. Adjust the process parameters of m...
Embodiment 2
[0033] 1. Select SrS and TiS with a purity of 99.99% respectively 2 and Al 2 S 3 Powder (wherein, the quality of SrS is 60g, TiS 2 The mass is 0.2g, Al 2 S 3 The mass is 139.8g), after being uniformly mixed, sintered at 900°C under the protection of argon, and cooled naturally to obtain a target sample, which was cut into a target with a diameter of 50mm and a thickness of 2mm;
[0034] 2. Put the target into the vacuum chamber of the magnetron sputtering coating equipment;
[0035] 3. Clean the glass ultrasonically with acetone, absolute ethanol and deionized water successively, and perform oxygen plasma treatment on it, and then put it into the vacuum chamber of the magnetron sputtering coating equipment; among them, the distance between the target and the glass Set to 45mm;
[0036] 4. Use a mechanical pump and a molecular pump to pump the vacuum of the vacuum chamber of the magnetron sputtering coating equipment to 1.0×10 -3 Pa;
[0037] 5. Adjust the process param...
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