Device and method for detecting wave-front aberrations of beam expanding and collimating system

Abstract

The invention provides a device and a method for detecting wave-front aberrations of a beam expanding and collimating system. The device comprises a cutting unit, an adjusting unit, an imaging unit, a photoelectric detection unit, a storage unit and a signal processing unit, wherein the cutting unit, the imaging unit and the photoelectric detection unit are arranged successively on a light path of emitted beams of the beam expanding and collimating system, and the cutting unit is placed between the beam expanding and collimating system and the imaging unit; the cutting unit comprises a one-dimensional phase grating A, a one-dimensional phase grating B, a phase grating C and a phase grating D successively along the light path direction; and grating planes of the four gratings of the cutting unit are mutually parallel and perpendicular to the light path of the emitted beams. According to the device and the method for detecting the wave-front aberrations of the beam expanding and collimating system, cutting wave-front information in x and y directions can be measured simultaneously, and further, the detection speed and the detection accuracy are improved.

Description

technical field [0001] The invention belongs to the technical field of optical detection, and in particular relates to a device and method for detecting wavefront aberration of a beam expanding collimation system. Background technique [0002] Although the beam emitted by the laser has good directionality, it still has a certain divergence angle. At present, the beam expander collimation system is usually used to improve its directionality, that is, the beam expander collimator system is set on the optical path of the laser, and the divergence angle of the beam emitted by the laser is compressed and the beam size is expanded. This process is called laser beam The expanded beam collimation. Beam expansion and collimation of laser beams are widely used in optical precision measurement and optical imaging. In terms of optical imaging, laser beam expansion and collimation is an important technology in laser direct writing lithography. After the laser beam passes through the be...

AI Technical Summary

Problems solved by technology

Before and after the 90-degree rotation operation, due to the axial runout error of the rotation adjustment device, the distance between the one-dimensional phase grating A and the one-dimensional phase grating B will change, that is, the shear wave surface information measurement in the x and y directions It is completed under different shear ratios, which affects the accuracy of detection to a certain extent

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