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Charged particle beam forming aperture and charged particle beam exposure apparatus

A technology of charged particle beams and holes, which is applied in the direction of photolithography exposure devices, electrical components, microlithography exposure equipment, etc., can solve problems such as dust emission, and achieve the effect of preventing the deterioration of exhaust capacity and low conductivity

Inactive Publication Date: 2013-03-06
CANON KK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, a sintered compact is generally used for conventional NEG, so that dust emission (emission) may occur depending on the heating method (activation method)
For example, if heating is performed by a charged particle beam such as electron beam irradiation, dust emission occurs, making it difficult to activate an inactive type of getter formed of a sintered compact by electron beam irradiation without dust emission. question

Method used

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  • Charged particle beam forming aperture and charged particle beam exposure apparatus
  • Charged particle beam forming aperture and charged particle beam exposure apparatus
  • Charged particle beam forming aperture and charged particle beam exposure apparatus

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Embodiment Construction

[0019] Hereinafter, embodiments of the present invention will be described. However, the present invention is not limited to the following description.

[0020] In the present invention, the charged particle optical system means the entire configuration in which a charged particle beam generated by a charged particle source is irradiated to an object to be exposed. The auxiliary vacuum pump means a getter pump as a vacuum pump for removing gas around the charged particle beam generator.

[0021] A holed member of a first embodiment of the present invention will be described with reference to FIGS. 1 to 3 .

[0022] Figure 1A is a top view of an apertured component according to aspects of the invention. A part of the charged particle beam is blocked by the apertured member 001, and a part of the charged particle beam passes through the through hole 002 provided in the apertured member 001 and is irradiated to the object to be exposed. The apertured member or combination of ...

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Abstract

The invention relates to a charged particle beam forming aperture and a charged particle beam exposure apparatus. The aperture that forms a charged particle beam includes a non-evaporable getter on a surface of the aperture. The non-evaporable getter is disposed in a position to which the charged particle beam is irradiated. The degradation of the exhaust performance around a charged particle source while the charged particle source is driven is suppressed.

Description

technical field [0001] The present invention relates to a charged particle beam forming aperture constituting an electron optical system for controlling a charged particle beam and a charged particle beam exposure apparatus for forming the aperture using a charged particle beam. Background technique [0002] Electron beam exposure technology is a strong candidate for photolithography capable of fine pattern exposure of 0.1 μm or less. So-called multi-beam systems are known in which a pattern is rendered on an object to be exposed by a plurality of electron beams simultaneously without using a mask in order to increase the throughput of electron beam exposure. [0003] In the multi-beam system, electron beams irradiated from a high-output electron source or a group of high-output electron sources are introduced into an electron optical system in which openings are arranged in a one-dimensional array or two-dimensional array, so that a plurality of electron beams are obtained....

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01J37/147H01J37/21H01J37/317G03F7/20
CPCH01J37/09G21K1/02H01J37/18B82Y10/00B82Y40/00H01J7/183H01J7/186H01J37/3177
Inventor 吉武惟之安藤洋一
Owner CANON KK