55 results about "Non-Evaporable Getter" patented technology

The invention discloses an intermediate temperature glass-metallic structure solar vacuum thermal-collecting tube, which belongs to the technical field of solar utilization, wherein a layer of temperature-resistant anti-oxidation film is plated on the outer surface of a heat-transfer pipe provided with a heat-conductive wing in the intermediate temperature glass-metallic solar vacuum thermal-collecting tube, and the film layer is aluminum or zinc or nickel or chromium or stainless steel; the heat-conductive wing is a thin aluminum plate which is coiled into the shape of an opening cylinder or a semicircular cylinder, and is tightly connected or welded with a U-shaped copper tube or a copper heat pipe of the temperature-resistant anti-oxidation film; and a heat-conductive wing tube is arranged inside the all-glass solar vacuum thermal-collecting tube, and closely contacts the inner wall of the all-glass solar vacuum thermal-collecting tube. A non-evaporable getter can be arranged inside a vacuum interlayer of the all-glass solar vacuum thermal-collecting tube, thereby improving the vacuum service life of the all-glass solar vacuum thermal-collecting tube after the long-term operating temperature is extended to more than 140 DEG C. The invention is a novel intermediate temperature glass-metallic solar vacuum thermal-collecting tube with high cost performance, and can meet the requirements of solar air-conditioners and industrial heat.

The invention relates to a device and a method for calibrating a flow-dividing vacuum leaking hole, in particular to the device and the method for calibrating the vacuum leaking hole, the leakage value of which is less than 1*10-8 Pa.m3/s by adopting flow-dividing technology, and belongs to the field of measuring technology. The device consists of the calibrated leaking hole, a valve, an ionization gauge, a small hole, a flow-dividing chamber, a non-evaporable getter pump, an ultrahigh vacuum calibrating chamber, a metering hole, a very high vacuum pumping chamber, an oil-free bi-turbo molecular pump air exhauster set, a quadrupole mass spectrometer, a flow meter, a super-high vacuum calibrating chamber, the metering hole, a super-high vacuum pumping chamber and a common molecular pump air exhauster set. The method adopts a fixed flow method gas micro-flow meter to provide a known gas flow rate, so the measuring range of the flow rate is wide and uncertainty of the measurement is low; and by adopting a flow-dividing method to calibrate the vacuum leaking hole, the method of the invention completely avoids a nonlinear error of the quadrupole mass spectrometer and can precisely calibrate the vacuum leaking hole the leakage value of which is less than 1*10-8 Pa.m3/s.

The present invention provides a charged particle beam apparatus that keeps the degree of vacuum in the vicinity of the electron source to ultra-high vacuum such as 10⁻⁸ to 10⁻⁹ Pa even in the state where electron beams are emitted using a non-evaporable getter pump and is not affected by dropout foreign particles.

The present invention includes a vacuum vessel in which a charged particle source (electron source, ion source, etc.) is disposed and a non-evaporable getter pump disposed at a position that does not directly face electron beams and includes a structure that makes the non-evaporable getter pump upward with respect to a horizontal direction to drop out foreign particles into a bottom in a groove, so that the foreign particles dropped out from the non-evaporable getter pump do not face an electron optical system. Or, the present invention includes a structure that is covered by a shield means, or a means that is disposed immediately on a surface of the non-evaporable getter pump but at a position where the electron beams are not seen and has a concave structure capable of trapping the dropout foreign particles on a lower portion of the non-evaporable getter pump.

A vacuum device, including a substrate and a support structure having a support perimeter, where the support structure is disposed over the substrate. In addition, the vacuum device also includes a non-evaporable getter layer having an exposed surface area. The non-evaporable getter layer is disposed over the support structure, and extends beyond the support perimeter, in at least one direction, of the support structure forming a vacuum gap between the substrate and the non-evaporable getter layer increasing the exposed surface area.

An electronic device that is sealed under vacuum includes a substrate, a transistor formed on the substrate, and a dielectric layer covering at least a portion of the transistor. The electronic device further includes a layer of non-evaporable getter material disposed on a portion of the dielectric layer; and a vacuum device disposed on a portion of the substrate. Electrical power pulses activate the non-evaporable getter material.

Non-evaporable getter alloys are provided which can be activated at relatively low temperatures and are capable of efficiently sorbing hydrogen.

A method of manufacturing a getter structure, including forming a support structure having a support perimeter, where the support structure is disposed over a substrate. In addition, the method includes forming a non-evaporable getter layer having an exposed surface area, where the non-evaporable getter layer is disposed over the support structure, and includes forming a vacuum gap between the substrate and the non-evaporable getter layer. The non-evaporable getter layer extends beyond the support perimeter of the support structure increasing the exposed surface area.

The invention discloses an extremely high vacuum gauge calibration device and a method, belonging to measurement field. The device comprises an extremely high vacuum gauge, an extremely high vacuum calibration room, a first valve, a vacuum gauge to be calibrated, a small hole, a second valve, a third valve, a high-precision vacuum gauge, an extremely high vacuum aspirating chamber, an extremely high vacuum air-bleed set, a flow limiting hole, a pressure stabilizing chamber, a non-evaporable getter pump, an air source, a micrometering valve, a flowmeter air-bleed set and a fourth valve, and the peripheral equipment includes a heating device. With the device and the method disclosed by the invention, the measurement uncertainty is small, accurate calibration to the extremely high vacuum gauge within the pressure range smaller than 10<-9>Pa can be realized, and the flow measurement range is expanded.

The present invention provides a non-evaporable getter for an FED which can remove a plurality of types of gases. The non-evaporable getter for the FED has a first layer containing titanium, and a second layer containing crystalline zirconium layered on the first layer. The average value of crystalline grain sizes of the crystalline zirconium is 3 nm or more but 20 nm or less.

The invention discloses a nitrogen and hydrogen mixed gas vacuum leak hole calibration device. The device comprises a hydrogen gas and nitrogen gas supply system, a gas distribution chamber, a pressure gauge, a gas obtaining chamber, a low vacuum pump, a gas inlet chamber, a vacuum gauge, a high vacuum pump, a seepage device, a mass spectrometer, a non-evaporable getter pump, a calibration systemand a gas extracting system; the pressure gauge is arranged on the gas distribution chamber; the gas distribution chamber is divided into two paths; one path is connected with the gas obtaining chamber and the gas inlet chamber; the other path is connected with the high vacuum pump through a pipeline; the hydrogen gas and nitrogen gas supply system and the low vacuum pump are arranged between thegas distribution chamber and the high vacuum pump; the high vacuum pump is connected with the gas inlet chamber; the gas inlet chamber is sequentially connected with the seepage device, the calibration system and the gas extracting system through pipelines; the pressure gauge and the vacuum gauge are arranged on the gas inlet chamber; a stop valve is arranged between the seepage device and the calibration system; a nitrogen and hydrogen mixed gas vacuum leak hole is connected to the calibration system; the pressure gauge, the vacuum gauge and the mass spectrometer are arranged on the calibration system; and the non-evaporable getter pump is connected to the calibration system.

A field emission display (FED) and a manufacturing method thereof are provided. The FED includes a getter portion isolated outwardly from an active display region. This getter portion includes a non-evaporable getter layer for absorbing gas and an electron emission source for activating the getter layer. Accordingly, by activating the non-evaporable getter, the gas generated in the display is easily absorbed, and the FED is maintained in a high vacuum state.

A flat panel display (7) generally includes a front substrate (79) and a rear substrate (70) opposite thereto. The front substrate is formed with an anode (78). The rear substrate is formed with a cathode (71) facing the anode. Several sidewalls (72) are interposed between the front substrate and the rear substrate. At least one of the sidewalls has a getter unit (82), and a securing member (822) for fixing the getter unit thereon. The getter unit is comprised of non-evaporable getter material. Thereby maintaining a substantial vacuum in a chamber between the front substrate and the rear substrate.

The invention discloses a preparation method of a zirconium non- evaporable getter, comprising the following steps: (1) selecting 60-75 parts by weight of zirconium, 0-21 parts by weight of vanadium,4-25 parts by weight of bismuth and 3-11 parts by weight of iron as raw materials; (2) putting the mixed raw materials into a vacuum melting furnace to form a vacuum environment; (3) starting a heating system of the vacuum melting furnace, and melting the mixture in the furnace until the mixture is completed molten into a liquid state; (4) cooling the liquid melt into an alloy ingot, and crushingthe alloy ingot to alloy particles of 1-3 cm; (5) putting the alloy particles into a vacuum ball mill to make powder of 100 microns or less, and pressing the powder into a certain shape or into a carrier to form the getter. A formula and a preparation method of the existing non-evaporable getter are improved, so that the getting rate and the getting performance of a product are greatly improved, and meanwhile the activation temperature is lowered.

Non-evaporable getter alloys, such as Y 75%-Mn 15%-Al 10%, are provided and can be activated at relatively low temperatures and have good properties in sorbing a wide variety of gases, particularly hydrogen.

Compositions containing a mixture of non-evaporable getter alloys are described which, after having lost their functionality in consequence of the exposure to reactive gases at a first temperature, can then be reactivated through a thermal treatment at a second temperature that is lower than the first one.

An aperture that forms a charged particle beam includes a non-evaporable getter on a surface of the aperture. The non-evaporable getter is disposed in a position to which the charged particle beam is irradiated. The degradation of the exhaust performance around a charged particle source while the charged particle source is driven is suppressed.