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75results about "Discharge tube solid anodes" patented technology

Frame-shuttered CMOS image sensor with simultaneous array readout

A frame shuttered CMOS image sensor with simultaneous array readout. An array of CMOS pixels are printed on a silicon substrate. Within each pixel is a light sensitive region comprising a photo sensitive diode for converting photons into electrical charge and at least three transistors to permit reading of reset electrical charges and collected electrical charges and for re-setting the photosensitive diode. The sensor includes an array of signal and re-set readout capacitors located on the substrate but outside of the pixel array. Metal conductors printed in said substrate connect each pixel in said pixel array with a signal capacitor and a re-set capacitor in array of signal and re-set readout capacitors. Transistor switches printed in said substrate but outside of said pixel array are used to isolate the signal and re-set capacitors from each other and from the pixels. Control circuitry is provided for re-setting simultaneously each of the pixels in the pixel array, for collecting simultaneously re-set signals from each pixel on to one of the reset capacitors in the array of readout capacitors and for collecting simultaneously integrated pixel signals from each pixel on to one of the signal capacitors in the array of readout capacitors. Readout circuitry is provided for reading charges collected on the array of signal and re-set capacitors.
Owner:FORZA SILICON

Exponential-doping GaN ultraviolet photocathode material structure and preparation method thereof

InactiveCN102087937AIncrease the diffusion drift lengthIncreased escape depthDischarge tube solid anodesCold cathode manufactureQuantum efficiencyPhotocathode
The invention provides an exponential-doping GaN ultraviolet photocathode material structure and a preparation method thereof. The structure is formed from a substrate, an unintentionally doped AlN buffer layer, a p-type exponential-doping GaN photoelectric transmission layer and a Cs or Cs/O activation layer which are arranged from bottom to top, wherein the unintentionally doped AlN buffer layer is grown on the substrate; the p-type exponential-doping GaN photoelectric transmission layer is epitaxially grown on the AlN buffer layer; and the Cs or Cs/O activation layer is adsorbed on the front surface of the p-type exponential-doping GaN photoelectric transmission layer. The exponential-doping GaN ultraviolet photocathode material structure has the following advantages: as the exponential-doping GaN photoelectric transmission layer is adopted, the runaway depth of the photo-induced electrons in the transmission layer is increased, and the probability of transmitting the electrons in the transmission layer to the vacuum is improved, thus improving the total quantum efficiency of the GaN ultraviolet photocathode and achieving higher ultraviolet sensitivity; and due to wide application of the exponential function in the technical field of engineering, the adoption of the exponential-doping GaN transmission layer facilitates theoretic design, theoretic simulation and data optimization.
Owner:NANJING UNIV OF SCI & TECH
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