Vacuum device capable of integrating ultraviolet light chemistry and chemical vapor dry surface treatment

Abstract

The invention discloses a vacuum device capable of integrating ultraviolet light chemistry and chemical vapor dry surface treatment, which consists of a vacuum chamber, an ultraviolet light source system, a vacuum pump system and a vacuum device control system, wherein the vacuum chamber consists of a high vacuum internal chamber and a low vacuum external chamber; an ultraviolet lamp light source is fixed on the top of the external chamber; a sample table with an adjustable height is arranged in the internal chamber; and a heating and water-cooling system is arranged outside the internal chamber. The invention also provides a using method of the vacuum device. The vacuum device is capable of accurately controlling the processes of the ultraviolet light chemistry and the chemical vapor dry reaction, so that materials, devices and the like can be effectively cleaned and modified; and the invention has important application value in the fields of materials and nanoscale optoelectronic devices.

Description

technical field [0001] The invention relates to the dry surface treatment technology of materials, more specifically, relates to a vacuum device integrating ultraviolet photochemistry and chemical vapor phase surface cleaning and modification. Background technique [0002] Ultraviolet photochemical surface treatment technology can effectively remove organic pollutants from most metals, semiconductors and insulating materials, and realize the modification of materials such as metals, semiconductors and carbon group elements. Industrial applications play an important role. This technology originated in the 1970s. It initially irradiated air or oxygen with ultraviolet light, and gradually developed into vacuum ultraviolet cleaning technology to further reduce the influence of water vapor, nitrogen dioxide and other gases in the air on photochemical reactions; on a large scale It has also developed from the initial low-power substrate cleaning equipment to high-power automatic ...

AI Technical Summary

Problems solved by technology

However, this method of applying instantaneous high current to electronic components to generate Joule heat to clean nanoelectronic devices also has many limitations: 1. The cleaning method of this current Joule heat is only applicable to electronic components, not outside of electronic components Other materials and nanodevices

2. This current Joule heat cleaning method is only for a specific graphene nanoelectronic device, not for the entire substrate

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