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Silicon carbide (SiC) Schottky diode and method for manufacturing same

A technology of Schottky diodes and fabrication methods, applied in semiconductor/solid-state device manufacturing, semiconductor devices, electrical components, etc., can solve problems such as no instance, reduce sensitivity, avoid the influence of breakdown voltage, and device fabrication process simple effect

Inactive Publication Date: 2013-03-27
INST OF MICROELECTRONICS CHINESE ACAD OF SCI +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] According to the characteristics of the above different junction terminal structures, the present invention proposes a SiC Schottky diode with a floating metal ring and a field plate combined with a junction terminal extension structure and a manufacturing method thereof. At present, this structure is used in SiC Schottky diode devices. The app has no instances yet

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  • Silicon carbide (SiC) Schottky diode and method for manufacturing same
  • Silicon carbide (SiC) Schottky diode and method for manufacturing same
  • Silicon carbide (SiC) Schottky diode and method for manufacturing same

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Embodiment Construction

[0038] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with specific embodiments and with reference to the accompanying drawings.

[0039] Such as figure 1 as shown, figure 1 It is a cross-sectional view of a SiC Schottky diode with a floating metal ring and a field plate junction terminal extension structure according to an embodiment of the present invention. The SiC Schottky diode consists of: N + - SiC substrate; formed on the N + -N on SiC substrate - - SiC epitaxial layer; formed on the N - - Schottky contact on top of SiC epitaxial layer; P formed at the edge of this Schottky contact - -SiC domain ring, the P - - SiC region ring as junction termination extension (JTE) region of the SiC Schottky diode; formed on the P - -n Schottky metal rings on the SiC area ring, n≥2, the Schottky metal rings and the P - -SiC area ring forms a Schottky c...

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Abstract

The invention discloses a SiC Schottky diode and a method for manufacturing the same. The SiC Schottky diode comprises an N <+>-SiC substrate, an N<->-SiC epitaxial layer, Schottky contact, a P<->-SiC area ring, n Schottky metal rings, a SiO2 passivation layer, field plates and N-type ohmic contact. The N<->-SiC epitaxial layer is formed on the N <+>-SiC substrate; the Schottky contact formed on the N<->-SiC epitaxial layer; the P<->-SiC area ring is formed at the Schottky contact edge and serves a junction termination extension (JTE) area; n Schottky metal rings is formed on the P<->-SiC area ring, wherein n>=2; the SiO2 passivation layer is formed among the Schottky metal rings; field plates are formed on the SiO2 passivation layer; and the N-type ohmic contact is formed on the back surface of the N <+>-SiC substrate. According to the SiC Schottky diode and the method for manufacturing the same, when the JTE effective concentration of a single area is lower than an optimal concentration, the sensitivity degree of an apparatus breakdown voltage to the JTE concentration is reduced, and simultaneously, effects of interface charges on the apparatus breakdown voltage are prevented and the improvement of the apparatus performance is facilitated.

Description

technical field [0001] The invention relates to the technical field of semiconductor devices, in particular to a SiC Schottky diode with a floating metal ring and a field plate junction terminal extension structure and a manufacturing method thereof. Background technique [0002] Wide bandgap semiconductors generally refer to silicon carbide (SiC), gallium nitride (GaN), etc. with a bandgap width of about 3.0 eV or above. Compared with Si materials, these materials have the advantages of wider band gap, high breakdown electric field, high thermal conductivity, high electron saturation rate, etc., and are the preferred materials for preparing power electronic devices. Among them, the Schottky diode made of SiC material is a majority carrier device. This structure is characterized by no injection and storage of additional carriers, fast switching speed, and low switching loss. It can be widely used in electric vehicles / hybrids Inverters, converters, PFC circuits that require ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L29/872H01L29/40H01L21/04
Inventor 白云刘可安申华军汤益丹王弋宇韩林超刘新宇李诚瞻史晶晶
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI