Adjustable gas distribution system and magnetron sputtering coating device comprising same

A gas distribution system and magnetron sputtering technology, applied in sputtering coating, ion implantation coating, vacuum evaporation coating and other directions, can solve the problems of decreased application effect, high production cost, difficult operation and maintenance, etc. To achieve the effect of convenient operation and maintenance, low production cost and uniform film layer

Active Publication Date: 2013-04-03
GUANGDONG ZHICHENG CHAMPION GROUP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this hybrid air distribution pipe has the following defects: 1. Although this air distribution system can further optimize the uniformity of air distribution, it lacks adjustability. It is a preset and fixed device with only a certain scope of application. In the application fields that require high film consistency, when the gas flow rate changes, the pores are blocked, the gas type changes, and the target-base distance is uneven, the application effect will decrease; 2. The adjustment of the uniformity of the gas distribution is lack of quantification Indicators, mostly judged by experience
Although this binary air distribution tube is adjustable, it does not have the function of measuring the amount of air distribution in different areas, and cannot achieve quantitative measurement. Therefore, when plating different film thicknesses, it can only be adjusted and judged based on experience, so it cannot be applied. into precise coating, and its gas distribution method is complex in structure, high in production cost, difficult in operation and maintenance

Method used

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  • Adjustable gas distribution system and magnetron sputtering coating device comprising same
  • Adjustable gas distribution system and magnetron sputtering coating device comprising same
  • Adjustable gas distribution system and magnetron sputtering coating device comprising same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0063] Such as figure 1 As shown, the adjustable air distribution system described in this embodiment includes three air distribution pipes arranged in parallel, which are respectively the first air distribution pipe 11, the second air distribution pipe 12 and the third air distribution pipe 13. In the first air distribution pipe 11 The first flow meter 14 for controlling its gas flow is arranged on the top, the second flow meter 15 for controlling its gas flow is arranged on the second gas distribution pipe 12, and the second flow meter 15 for controlling its gas flow is arranged on the third air distribution pipe 13 The third flow meter 16.

[0064] The first air distribution pipe 11 , the second air distribution pipe 12 and the third air distribution pipe 13 are provided with air blowing sections matching the length of the target surface of the magnetron sputtering target, and the blowing sections of the three air distribution pipes have the same length.

[0065] Such as ...

Embodiment 2

[0078] Such as Figure 6 As shown, the adjustable air distribution system described in this embodiment includes four air distribution pipes arranged in parallel, namely the first air distribution pipe 41, the second air distribution pipe 42, the third air distribution pipe 43 and the fourth air distribution pipe 44 , a first flow meter 45 for controlling its gas flow is arranged on the first air distribution pipe 41, a second flow meter 46 for controlling its gas flow is arranged on the second air distribution pipe 42, and a third air distribution pipe 43 A third flowmeter 47 for controlling the gas flow is provided, and a fourth flowmeter 48 for controlling the gas flow is arranged on the fourth air distribution pipe 44 .

[0079] The first gas distribution pipe 41, the second gas distribution pipe 42, the 3rd gas distribution pipe 43 and the 4th gas distribution pipe 44 are provided with an air blowing section matching the length of the target surface of the magnetron sputteri...

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PUM

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Abstract

The invention discloses an adjustable gas distribution system and a magnetron sputtering coating device comprising the adjustable gas distribution system. The adjustable gas distribution system comprises at least two parallel gas distribution pipes; a flowmeter is arranged on each gas distribution pipe; blowing parts are arranged on two adjacent gas distribution pipes in a staggered manner and comprise a plurality of air holes which are of the same specification and formed uniformly; each air hole is formed in the radial direction of one gas distribution pipe; and the air holes are arranged in the axial directions of the gas distribution pipes in sequence. The gas distribution system is provided with at least two gas distribution pipes, and the blowing parts are on two adjacent gas distribution pipes in a staggered manner, so that gas blown out by the gas distribution system can reach a target surface uniformly, and then a film is ensured uniformity; the flowmeters are arranged on the gas distribution pipes, so that the flow rate of gas can be adjusted in real time, namely, the flow rate of gas can be adjusted accurately according to the distance between the target surface and the surface of an object to be coated, and different coating thicknesses; and the flow rates of gas blown out from all the gas distribution pipes can be the same, so that the purposes of controlling in real time and coating accurately can be achieved.

Description

technical field [0001] The invention relates to the technical field of magnetron sputtering coating, in particular to an adjustable gas distribution system and a magnetron sputtering coating device including the adjustable gas distribution system. Background technique [0002] Magnetron sputtering coating technology is a widely used coating technology method at present. It is widely used in optics, microelectronics, wear resistance, corrosion resistance, decoration and other industrial fields to provide reliable and stable thin film coatings. Such as decorative color coating, mobile phone case coating, architectural glass low-e coating, ITO transparent conductive glass coating, etc. [0003] The uniformity of the magnetron sputtering coating is very important, especially for the coating of optical and microelectronic products, and its uniformity has an important impact on the quality and yield of the product. There are many factors that affect the uniformity of the magnetro...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35
Inventor 陈宇
Owner GUANGDONG ZHICHENG CHAMPION GROUP
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