Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Fluorine-based polymer thin film and method for preparing same

A technology for polymer films and substrates, used in bonding methods, chemical instruments and methods, ester copolymer adhesives, etc., can solve problems such as poor bonding strength, achieve easy repair, maintain water resistance and antifouling properties , the effect of improving durability

Inactive Publication Date: 2013-04-03
LG CHEM LTD
View PDF6 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, the problem with fluorine-based polymers is that the bond strength with the substrate is poor due to low surface energy

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Fluorine-based polymer thin film and method for preparing same
  • Fluorine-based polymer thin film and method for preparing same
  • Fluorine-based polymer thin film and method for preparing same

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0028] The method for preparing a fluorine-based polymer film according to the present invention includes the following steps: a) forming a fluorine-based polymer film on a first substrate; b) forming a fluorine-based polymer film containing a first functional group on the fluorine-based polymer film. a thin layer; c) forming a thin layer comprising a second functional group on a second substrate; and d) chemically bonding the first functional group and the second functional group to each other.

[0029] The method for preparing a fluorine-based polymer thin film according to the present invention may further include separating the first substrate after step d).

[0030] Step a) is a step of forming a fluorine-based polymer film on a first substrate, the fluorine-based polymer film can be formed using a method known in the art, more specifically, the fluorine-based polymer The thin film can be formed using sputtering method, reduced pressure CVD method, plasma CVD method, hot ...

Embodiment 1

[0058] 1) A thin layer of PTFE is deposited using the HWCVD method. In this case, the monomer source used was gaseous HFPO (hexafluoropropylene oxide). The deposited PTFE thin layer has a thickness of 100 nm or less.

[0059] 2) After increasing the wettability by oxygen plasma treatment of the samples prepared in 1), polyglycidyl methacrylate was deposited using the HWCVD method. In this case, the deposited PGMA has a thickness of about 100 to 200 nm.

[0060] 3) The substrate prepared in 2) and the aminosilane-treated glass were thermally cured in an oven at 150° C. for 1 to 3 hours under normal pressure by applying a predetermined pressure.

[0061] 4) The results in Table 1 below were obtained by measuring the water contact angle and surface energy of the sample transferred in 3).

[0062] 5) The adhesive properties of the sample on which PTFE was transferred and the PTFE on which bare glass was placed were confirmed by the change of water contact angle with the number ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The present invention relates to a fluorine-based polymer thin film and to a method for preparing same. The method for preparing a fluorine-based polymer thin film according to the present invention comprises: a) a step of forming a fluorine-based polymer thin film on a first base; b) a step of forming a thin film containing a first functional group on the fluorine-based polymer thin film; c) a step of forming a thin film containing a second functional group on a second base; and d) a step of chemically bonding the first functional group and the second functional group together. According to the present invention, the fluorine-based polymer thin film can be stably formed on the base, the durability of the thin film is improved, and the water-repellency and contamination resistance properties of the thin film are maintained over a long period of time.; In addition, the method for forming the fluorine-based polymer thin film on the base according to the present invention exhibits superior processability and enables easy repair and maintenance upon the occurrence of damage to the base.

Description

technical field [0001] The present invention relates to a fluorine-based polymer film and a preparation method thereof. This application claims priority to Korean Patent Applications Nos. 10-2010-0070903 and 10-2011-0073128 filed in the Korean Intellectual Property Office on Jul. 22, 2010 and Jul. 22, 2011, the disclosures of which are incorporated by reference Incorporated into this article as a whole. Background technique [0002] Typically, fluorine-based polymers have a low surface energy of about 5~6 dynes / cm to achieve functions such as water repellency, oleophobicity, chemical resistance, lubricity, mold release, and stain resistance. Fluorine compounds having the above-mentioned functions can be widely used in various fields such as special fields such as high-tech industry and fine chemicals to daily life, and demand thereof is currently rapidly increasing. In particular, with the popularization of personal computers and the generalization of the use of automobile...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/12C08F14/18C08F14/20C08F14/22C09J5/04
CPCC08F14/22B32B7/10C23C14/12C09J5/00B32B27/322C08F14/20B32B38/10C09J5/04C08F14/18C08J5/12C08J2327/12C08J2333/06Y10T156/10Y10T428/3154Y10T428/31544C09J133/04C09J163/00C08J5/18
Inventor 林振炯崔贤金起焕
Owner LG CHEM LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com