Polishing agent for precise polishing of high-alloy-aluminium metallographic sample, and precise polishing method

A metallographic sample and aluminum alloy technology, which is applied in the field of fine polishing, can solve the problems of large differences in electrochemical or chemical corrosion rates, time-consuming, observation artifacts, etc., to shorten the time for fine polishing, avoid observation artifacts, and eliminate The effect of the perturbation layer

CN103074631AInactive Publication Date: 2013-05-01SOUTHWEST ALUMINUM GRP
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Publication Date
2013-05-01
Estimated Expiration
Not applicable · inactive patent

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Abstract

The invention discloses a polishing agent for precise polishing of a high-alloy-aluminium metallographic sample. The polishing agent comprises water, corundum particles and sodium hydroxide, namely, sodium hydroxide, which is an chemical aggressive agent, is added in corundum polishing suspension formed by water and corundum powder, so that not only can the problems of disturbance layers and scratches of mechanical polishing be avoid, but also the problem of disappearance or protrusion of part of phase corrosion of electrolysis and chemical polishing can be avoid, further, the circumstance of observation illusion can be avoided; and meanwhile, the time for precise polishing can be shortened greatly, so that the purpose of preparing high-quality metallographic samples quickly can be achieved. When the agent for precise polishing of a high-alloy-aluminium metallographic sample, provided by the invention, is in use, a polisher is started first, then a reagent bottle filled with the polishing agent is shaken until the polisher runs normally so as to ensure that the polishing agent is mixed uniformly, and the reagent bottle is compressed to enable the polishing agent to be uniformly sprayed onto polishing fabric of the polisher. The invention further discloses a precise polishing method for a high-alloy-aluminium metallographic sample.
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Description

technical field

[0001] The invention relates to the technical field of fine polishing, in particular to a polishing agent for fine polishing of high-alloy aluminum metallographic samples. The invention also relates to a fine polishing method for a high-alloy aluminum metallographic sample. Background technique

[0002] The preparation of metallographic samples is the basic work of material research. Aluminum alloys are more difficult to prepare high-quality metallographic samples due to their low hardness.

[0003] Traditional methods only use one of mechanical polishing, electrolytic polishing or chemical polishing to prepare metallographic samples. Mechanical polishing alone uses the mechanical cutting effect of abrasives and polishing agents used in conjunction with abrasives to cut the surface of the sample and finally achieve the effect of an optical mirror. This method takes a long time and it is difficult to completely eliminate mechanical scratches on the surface of...

Examples

Embodiment Construction

[0022] The core of the present invention is to provide a polishing agent for fine polishing of high-alloy aluminum metallographic samples, so as to avoid the situation of observation artifacts; another core of the present invention is to provide a method for fine polishing of high-alloy aluminum metallographic samples.

[0023] In order to enable those skilled in the art to better understand the solution of the present invention, the present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments.

[0024] The polishing agent for fine polishing of high-alloy aluminum metallographic samples provided in the embodiments of the present invention includes water, corundum particles and sodium hydroxide. That is to say, adding the chemical etching agent sodium hydroxide to the corundum polishing suspension formed by water and corundum powder not only eliminates the problems of disturbance layer and scratches in mechani...