Solar cell
A technology of solar cells and conductive layers, applied in the field of solar cells, can solve the problems of increased electrode resistance and poor crystallinity, and achieve the effect of suppressing the decline of battery characteristics
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Embodiment 1
[0132] [Formation of auxiliary wiring for positive electrode]
[0133] [Preparation of silver halide emulsion]
[0134] The following solution A was kept at 34°C in the reaction vessel, and the pH was adjusted to 2.95 with nitric acid (concentration: 6%) while stirring at high speed using a mixing and stirring device described in JP-A-62-160128. Next, the following solution B and the following solution C were added at a constant flow rate by the double injection method at intervals of 8 minutes and 6 seconds. After the addition, the pH was adjusted to 5.90 using sodium carbonate (concentration: 5%), and then solution D and solution E described below were added.
[0135] (Solution A)
[0136]
[0137] (Solution B)
[0138] Silver nitrate 169.9g
[0139] Nitric acid (6% concentration) 5.89 cm 3
[0140] The total amount of pure water is 317.1cm 3 .
[0141] (Solution C)
[0142] Alkali-treated inert gelatin (average molecular weight 100,000) 5.66g
[0143] Sodium ch...
Embodiment 2~9 and comparative example 1~6
[0217] An organic thin-film solar cell was produced in the same manner as in Example 1 except that the metal negative electrode and the auxiliary metal wiring for the negative electrode were changed as shown in Table 1, and the conversion efficiency was measured.
Embodiment 10
[0219] [Auxiliary wiring for positive electrode / Formation of positive electrode]
[0220] The auxiliary wiring for positive electrodes and the positive electrode were formed in the same manner as in Example 1.
[0221] [Formation of photoelectric conversion layer]
[0222] In the same manner as in Example 1, a composition obtained by dissolving P3HT and PCBM in chlorobenzene was coated on the positive electrode, and a bulk heterojunction photoelectric conversion layer was formed without heat treatment.
[0223] [Electron transport layer / Auxiliary metal wiring for negative electrode / Formation of translucent metal negative electrode]
[0224] Aluminum (film thickness: 2 nm) was vacuum-deposited on the entire surface of the photoelectric conversion layer as an electron transport layer.
[0225] Next, aluminum (film thickness: 0.4 μm) was vacuum-deposited on the electron transport layer as an auxiliary metal wiring for negative electrodes. At this time, vapor deposition was car...
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