Novel manufacturing method of hot wire micro-sensor with flexible wall surface
A technology of micro-sensors and flexible walls, applied in the field of micro-electromechanical systems, can solve the problems of affecting sensor performance, easy to break, affecting the size parameters and measurement performance of sensitive components, and achieving the effect of easy guarantee of graphic accuracy
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Embodiment 1
[0025] This embodiment proposes a method of etching on the back of the flexible hot wire microsensor, mainly that the patterning process of the sensitive element is a wet etching process, which specifically includes the following steps:
[0026] Step 1: Cut the copper foil with a thickness of 100 microns into a disc with a diameter of 80mm, and use a polishing machine to polish the surface, and clean the copper foil after polishing;
[0027] Step 2: Spin-coat PDMS with a thickness of 5 microns on the surface of the cleaned copper foil, wherein the ratio of PDMS glue and curing agent is 10:1; the rotation speed is 2500RPM;
[0028] Step 3: Lay a polyimide film with a thickness of 125 microns on the surface of copper foil spin-coated with PDMS, and stick it at a temperature of 70°C and a pressure of 130Pa;
[0029] Step 4: Put the polyimide with copper foil as the carrier into the sputtering chamber, deposit 0.3 μm nickel and 2 μm copper films respectively, and use a solution wi...
Embodiment 2
[0035] This embodiment proposes a method of etching on the back of the flexible hot wire microsensor, mainly the patterning method of the sensitive element is a stripping process, which specifically includes the following steps:
[0036] Step 1: Cut the aluminum foil with a thickness of 100 microns into a disc with a diameter of 80mm, and polish the surface with a polishing machine, and clean the aluminum foil after polishing;
[0037] Step 2: Spin-coat PDMS with a thickness of 5 microns on the surface of the cleaned aluminum foil, wherein the ratio of PDMS glue and curing agent is 10:1; the rotation speed is 2500RPM;
[0038] Step 3: Lay a polyimide film with a thickness of 125 microns on the surface of copper foil spin-coated with PDMS, and stick it at a temperature of 70°C and a pressure of 130Pa;
[0039] Step 4: Spin-coat the photoresist on polyimide with aluminum foil as the carrier, expose and develop, put the patterned photoresist into the sputtering chamber, deposit 0...
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Abstract
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