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High-transmittance photon sieve

A high transmittance, photon sieve technology, applied in the direction of diffraction grating, etc., can solve the problems of low light intensity, constant light intensity, and poor photolithography effect, so as to improve the transmittance, increase the intensity of light, and improve the quality of photolithography. effect of effect

Inactive Publication Date: 2013-05-08
INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] In view of this, the present invention provides a photon sieve with high transmittance to solve the problem that when the photon sieve is used for photoetching, the light intensity of the working light is constant, the light intensity at the focused spot is low, and the photoetching effect is poor. The problem

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Embodiment 1

[0042] This embodiment discloses a photon sieve with high transmittance, such as figure 1 As shown, the values ​​marked on the horizontal and vertical coordinates in the figure are the intercepted photon sieve sizes, including:

[0043] There are multiple groups of light-transmitting square microholes with different side lengths, and each group of square microholes is distributed on the same ring at intervals. The rings where each group of square microholes are located are a series of concentric circles with different radii. The radius of the mth ring is r m and belt width w m satisfy the relation:

[0044] r m 2 =2mfλ+m 2 lambda 2 ,w m = r m -r m-1 , m=1, 2, 3..., that is, m is a series of natural numbers starting from 1 and not including 0;

[0045] The λ is the wavelength of the incident light, and the f is the focal length of the photon sieve. Generally, the focal length f is fixed according to the actual situation, so the radius r of the ring can be finally dete...

Embodiment 2

[0055] Replacing circular microholes with square microholes can increase the light intensity at the focused spot, but different effects can be achieved for different settings of square microholes. In order to achieve the best effect, this embodiment discloses an optimal high Transmittance photon sieve, the photon sieve described in this embodiment includes:

[0056] A light-transmitting quartz substrate and an opaque metal chromium film plated thereon, the diameter of the quartz substrate is 10cm, and multiple groups of light-transmitting square microholes with different side lengths are distributed on the metal chromium film. The square microholes are distributed on the same ring at intervals, the diagonal of the square microholes is parallel or perpendicular to the tangent of the ring, and the rings where each group of square microholes are located have a common center and different radii. The number m of each outer ring is a natural number selected from 1 to 370, including ...

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Abstract

The invention discloses a high-transmittance photon sieve which comprises a plurality of groups of photic square micropores with different side lengths. Each group of square micropores are distributed on the same circular ring at intervals. The circular rings where the plurality of groups of square micropores are located are a series of concentric circles with different radii. The side length of each square micropore is 0.5-2 times of the ring width of the circular ring where the square micropore is located. When the sizes of focusing light spots are identical, the area of the photon sieve with the square holes is larger than that of the photon sieve with round holes. Therefore, when the light intensity of working light is constant and the same focusing light spots are formed, more light can transmit through the photon sieve with the square holes. Consequently, the light transmittance is improved, and the light intensity at the focusing light spots is improved, and the photoetching effects are also improved.

Description

technical field [0001] The invention belongs to the field of diffractive optical components, in particular to a photon sieve with high transmittance. Background technique [0002] Traditional optical lenses are made of glass, and the focusing and imaging of glass lenses are achieved by refracting incident light, so they become refractive lenses. In addition, there is a kind of lens, which is a diffractive optical focusing element. By selecting and filtering the wavefront of the incident light, the filtered light wave is diffracted in space to form a focus. Therefore, it is called a diffractive lens. It is made according to the Fresnel diffraction theorem. , so it is also called a Fresnel zone plate. [0003] The resolution of the Fresnel zone plate depends on the width of its outermost ring, but this size is limited by the processing technology, so it is difficult to further improve the resolution of the Fresnel zone plate. In view of this, in 2000, someone proposed a diff...

Claims

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Application Information

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IPC IPC(8): G02B5/18
Inventor 谢常青辛将朱效立刘明
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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