Accurate calibration method of film coating rate and application thereof

Abstract

The invention discloses an accurate calibration method of the film coating rate and application of the accurate calibration method. The accurate calibration method of the film coating rate includes the following steps of preparing a standard substrate composed of a liner and an interference film, wherein a preparation method includes the step of leading in a layer of interference film which is enough to form interference on the liner, measuring the transmission spectrum or the reflectance spectrum of the standard substrate, coating the film to be tested on the standard substrate for a while, measuring the transmission spectrum or the reflectance spectrum of the standard substrate coated with the film, comparing the transmission spectrum or the reflectance spectrum of the standard substrate to be coated with the film and that of the standard substrate coated with the film, and calculating the depth of the coated film according to the variation quantity the peak position so as to work out the film coating rate. According to the accurate calibration method of the film coating rate, a layer of interference film sufficient to form the interference is led in on the liner in advance, on the basis, just the very thin film to be tested is coated on the standard substrate, and obvious shift of the interference peak position can be caused. Therefore, the intensity change from the prior transmission spectrum to the late transmission spectrum is higher than that of a traditional method that a film to be tested is directly coated on the liner. Calibration precision can be obviously improved. The accurate calibration method of the film coating rate is very appropriate for online testing and real-time monitoring, and especially suitable for accurate calibration of ultra low film coating rate.

Description

technical field [0001] The invention relates to the field of thin films, in particular to an accurate calibration method of coating rate and its application. Background technique [0002] Thin film technology plays an increasingly widespread and important role in the development of science and technology, and film thickness monitoring technology, as a key technology in thin film technology, has also attracted more and more attention. The coating rate is very important to the design, function realization and control of optical devices in the process, especially with the in-depth development of soft X-ray multilayer film technology, the accuracy of coating in the short-wave band is getting higher and higher. Accurately measuring the coating rate at each point and strictly controlling the measurement accuracy has become one of the important factors affecting its development. [0003] For the soft X-ray multilayer film, due to its extremely thin thickness, the coating rate cann...

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Problems solved by technology

[0007] The purpose of the present invention is to overcome the principle limitations and insurmountable difficulties of the traditional method, and provide a simple and quick method for accurately calibrating the coating rate of various dielectric thin films. This method can maintain the advantages of the traditional optical monitoring method, and can Eliminate the stability problems of methods such as quartz crystal oscillators, especially suitable for on-line detection and real-time monitoring, especially suitable for accurate calibration of ultra-low coating rates

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