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A machining process and a rework process for a mask plate for vapor deposition

A processing technology and mask technology, which is applied in vacuum evaporation coating, metal material coating technology, sputtering coating and other directions, can solve the problems of large upper and lower openings and small middle openings, so as to improve the film forming rate and reduce scrap. The effect of improving the accuracy of opening size and production pass rate

Inactive Publication Date: 2013-07-17
KUN SHAN POWER STENCIL
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] The purpose of the present invention is to solve at least one of the above-mentioned technical defects, especially to solve the problem of large upper and lower openings and small middle openings caused by side etching in the etching process

Method used

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  • A machining process and a rework process for a mask plate for vapor deposition
  • A machining process and a rework process for a mask plate for vapor deposition
  • A machining process and a rework process for a mask plate for vapor deposition

Examples

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Effect test

Embodiment 1

[0051] The main innovation of the present invention is that the present invention innovatively proposes a processing technology of a mask plate for evaporation, please refer to Figure 8 , processing technology of the present invention comprises the steps:

[0052] Step S1: See figure 1 , image 3 , the etching starts, part of the surface of the metal mask 2 is protected by patterns (exposure dry film) 1, 3, and the rest of the surface of the metal mask 2 is in contact with the etching solution. At this time, the etching proceeds vertically to the depth (direction of arrow 4).

[0053] In this embodiment, the material of the mask can be Invar alloy; the thickness of the mask is 30-150 μm.

[0054] Step S2: See figure 2 , when the upper surface of the metal mask 2 is etched to a certain depth, a new metal mask surface appears on both sides of the bare, at this time, the etchant flows to both sides (arrow 4) in addition to the vertical direction (arrow 4) 5 direction) for ...

Embodiment 2

[0071] The invention proposes a repairing process of a mask plate for vapor deposition, which adopts sandblasting micro-processing to repair the mask plate with unqualified openings. see Figure 6 , Figure 7 , carry out sand blasting treatment to the protrusion 10 at the opening, the sand blasting treatment is as Figure 6 In the direction indicated by the middle arrow 8, a new opening 9 is formed; the difference between the upper and lower dimensions of the opening and the middle dimension meets the setting requirements.

[0072] After the sandblasting micro-treatment, conduct a secondary inspection on the opening of the mask to judge whether it is qualified; if the difference between the upper and lower dimensions of the opening and the middle dimension is still greater than the set value, continue to perform sandblasting without treatment until the deviation of the opening size is controlled within ±20μm .

[0073] In one embodiment of the present invention, the micro-t...

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Abstract

The invention provides a machining process and a rework process for a mask plate for vapor deposition. The machining process comprises: etching a metal mask plate to form a final opening; detecting the dimensions of the opening of the mask plate to determining if the dimensions are eligible; and if the difference between the upper dimension and the middle dimension and the difference between the lower dimension and the middle dimension of the opening are larger than a set value, performing sand blasting microtreatment to rework the mask plate with an ineligible opening, namely performing sand blasting treatment on the bump of the opening to make the difference between the upper and lower sizes and the middle size of the opening fit the set value. Through the machining process and the rework process for the mask plate for vapor deposition, the problem that the opening has larger upper and lower sizes but a smaller middle size resulting from lateral etching in an etching process is solved, thus improving the opening size accuracy and the production yield, reducing scrappage, and meanwhile increasing the film-forming rate of an organic vapor deposition material in the deposition process.

Description

technical field [0001] The invention belongs to the field of mask processing, and relates to a mask for evaporation, in particular to a process for processing a mask for evaporation; at the same time, the invention also relates to a repair process for a mask for evaporation. [0002] Background technique [0003] Organic Light Emitting Display (OLED for short) not only has the characteristics of high brightness and low energy consumption of CRT display, and the light and thin characteristics of LCD display, but also has the outstanding advantages of not being restricted by the environment and not requiring a backlight. The pattern text can be easily seen even in sunlight, and it has the function of folding. OLED displays can be made lighter and thinner, have a wider viewing angle, and can significantly save power. The composition of OLED includes a glass substrate of about 1.3mm, high-purity metal material less than 0.3mm and ITO conductive glass, with a total thickness of...

Claims

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Application Information

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IPC IPC(8): C23C14/04C23F1/02
Inventor 魏志凌高小平郑庆靓孙倩
Owner KUN SHAN POWER STENCIL
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