Multilayer asymmetrical metamaterial capable of realizing Fano resonance enhancement
A Fano resonance and asymmetric technology, applied in the direction of electrical components, antennas, etc., can solve the problems that limit the application of Fano resonance
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[0021] First, a multilayer structure (lower metal layer 3-dielectric layer 4-upper metal layer 3-oxidation layer 5) 2 is formed on a glass substrate 1 by material growth process, as shown in the attached figure 2 (a) shown.
[0022] Second, deposit SiO on the multilayer structure 2 2 film as a mask 6, as attached figure 2 (b) shown.
[0023] Then, the designed resonant cell array is transferred to the mask through the mask process, as shown in the attached figure 2 (c) shown. Among them, the structure design can adopt algorithms such as finite time domain difference method and finite element method.
[0024] Then, through an etching process, the resonant unit array 7 is prepared on the 2 material, and the resonant unit deviates from its central position while penetrating the lower metal layer-dielectric layer-upper metal layer-oxidation layer, as shown in the attached figure 2 as shown in (d)
[0025] Finally, the mask 6 is removed to obtain a multilayer asymmetric metam...
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