Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Polyhedron main substrate, manufacturing method and processing method thereof

A manufacturing method and technology of the main substrate, which are applied to the exposure device, installation, optics, etc. of the photoengraving process, can solve the problems of excessive quality, difficult workability, long delivery time, etc., and achieve good dynamic performance and stability. The overall structure is compact and efficient

Active Publication Date: 2015-07-22
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
View PDF10 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] The present invention aims to provide a polyhedral main substrate structure aimed at the defects of the existing photolithography machine main substrate, such as high manufacturing cost, difficult processability, long delivery period, poor dynamic performance, and excessive quality.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Polyhedron main substrate, manufacturing method and processing method thereof
  • Polyhedron main substrate, manufacturing method and processing method thereof
  • Polyhedron main substrate, manufacturing method and processing method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0041] In order to illustrate the technical content, structural features, achieved goals and effects of the present invention in detail, the following will be described in detail in conjunction with the embodiments and accompanying drawings.

[0042]The polyhedral main substrate of the present invention is used for installing the supporting device, the measuring device and the lens barrel device, and at least one station is provided on the main substrate. Wherein, the outer surface of the main substrate is defined by the polygonal enveloping surface of the installation area of ​​the supporting device, the measuring device, and the lens barrel device, and is a convex polyhedron formed by connecting several other planes according to convex hull rules. In a specific implementation manner, the enumeration that the polyhedral main substrate is a double-station main substrate should not be considered as a limitation of the present invention.

[0043] see figure 1 , figure 2 , fi...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a polyhedron main substrate for installing support devices, a measurement device and a lens barrel device, wherein the main substrate is provided with at least a working position, and the outer surface of the main substrate is defined by polygon enveloping surfaces of installation regions of the support devices, the measurement device and the lens barrel device, and is a convex polyhedron formed through connecting a plurality of other planes according to a convex enveloping rule. According to the present invention, based on the polyhedron structure design, the whole structure of the obtained main substrate is simple and efficient, good dynamic performance and good stability can be achieved, processing characteristics of integrated main substrate casting are met, and the main substrate formed through the combination has performance advantages of high modality and low quality compared with the existing structure.

Description

technical field [0001] The invention relates to semiconductor manufacturing equipment, in particular to a polyhedral main substrate structure used in photolithography equipment and its manufacturing method and processing method. Background technique [0002] The main substrate and the measurement bracket are the core of the frame design of the lithography machine. It not only needs to have high-mode characteristic indicators to meet the needs of short-term stability and dynamic performance, but also must find a very good solution in the field of materials and heat transfer. A good balance point to meet the needs of long-term thermal stability. In addition, with the increase in the quality of the objective lens and measurement system, the design of the main substrate and measurement bracket is forced to meet the development trend of low quality and light weight. Therefore, the design direction of the main substrate and the measurement bracket needs to have the dual character...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20G02B7/00
Inventor 吴飞王茜魏巍袁志扬陈文枢
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com