Insulated heat-conducting substrate with high reliability
An insulating and heat-conducting substrate, insulating and heat-conducting technology, applied in semiconductor devices, semiconductor/solid-state device manufacturing, semiconductor/solid-state device components, etc., to achieve the effects of low thermal stress, good reliability, and good adhesion
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Embodiment 1
[0014] The high-reliability insulating and heat-conducting substrate described in this embodiment includes an aluminum base, an amorphous aluminum transition layer is deposited on the base, and an AlON insulating and heat-conducting ceramic layer is deposited on the aluminum transition layer by PECVD. The copper foil is brazed on the insulating and heat-conducting ceramic layer through an active brazing process. The thickness of the amorphous aluminum transition layer is 200 nm, and it is prepared by a radio frequency sputtering process, the target material is an aluminum target with a purity of 99.99%, the sputtering gas is Ar, the sputtering power is 1.0 kW, and the radio frequency 13.56MHz, the working pressure is 3×10 -3 torr, the substrate temperature is 25°C. The thickness of the insulating and heat-conducting ceramic layer is 200 um. Described PECVD method, its reaction system is AlCl 3 -N 2 O-NH 3 -H 2 , the reaction temperature is 300℃, the working pressure is ...
Embodiment 2
[0016] The high-reliability insulating and heat-conducting substrate described in this embodiment includes an aluminum base, an amorphous aluminum transition layer is deposited on the base, and an AlON insulating and heat-conducting ceramic layer is deposited on the aluminum transition layer by PECVD. The copper foil is brazed on the insulating and heat-conducting ceramic layer through an active brazing process. Wherein, the thickness of the amorphous aluminum transition layer is 100nm, and it is prepared by a radio frequency sputtering process, the target material is an aluminum target with a purity of 99.99%, the sputtering gas is Ar, the sputtering power is 0.5kW, and the radio frequency The frequency is 13.56MHz, and the working pressure is 5×10 -3 torr, the substrate temperature is 50°C. By depositing an amorphous aluminum transition layer, the adhesion between the insulating and heat-conducting ceramic layer and the aluminum substrate can be significantly enhanced, and...
Embodiment 3
[0018] The high-reliability insulating and heat-conducting substrate described in this embodiment includes an aluminum base, an amorphous aluminum transition layer is deposited on the base, and an AlON insulating and heat-conducting ceramic layer is deposited on the aluminum transition layer by PECVD. The copper foil is brazed on the insulating and heat-conducting ceramic layer through an active brazing process. The thickness of the amorphous aluminum transition layer is 500 nm, and it is prepared by a radio frequency sputtering process, the target material is an aluminum target with a purity of 99.99%, the sputtering gas is Ar, the sputtering power is 1.2 kW, and the radio frequency 13.56MHz, the working pressure is 5×10 -3 torr, the substrate temperature is 25°C. The thickness of the insulating and heat-conducting ceramic layer is 500 um. In the described PECVD method, the reaction system is AlCl 3 -N 2 O-NH 3 -H 2 , the reaction temperature is 300℃, the working press...
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Abstract
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