A kind of light-emitting diode and its preparation method
A technology of light-emitting diodes and light-emitting layers, which is applied to electrical components, circuits, semiconductor devices, etc., can solve the problems of poor conductivity of GaN, low luminous efficiency, poor quality of p-type GaN ohmic contact layer, etc., and improve external quantum efficiency , reduce ohmic contact resistance, and improve the overall electrical characteristics
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[0025] The present invention will be further described below in conjunction with the accompanying drawings.
[0026] like figure 1 Shown: a light-emitting diode with a new structure, including a substrate 101, a low-temperature AlN nucleation layer 102, a buffer layer 103, an n-type AlGaN layer 104, a multi-quantum well active light-emitting layer 106, and a p-type The AlGaN electron blocking layer 107, the p-type AlGaN layer 108 and the composite p-type GaN ohmic contact layer 109, the top surface of the composite p-type GaN ohmic contact layer 109 is provided with a p-type electrode 110, and the n-type AlGaN layer 104 A stepped mesa is etched, the extension of the stepped mesa is connected to the bottom surface of the multi-quantum well active light-emitting layer 106 , and an n-type electrode 105 is arranged on the stepped mesa.
[0027] like figure 2 As shown: the composite p-type GaN ohmic contact layer 109 includes a δ-doped P-type GaN layer of Mg and a uniformly dope...
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