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Air flotation pipe joint assembly and six-degree-of-freedom air flotation pipe joint and mask table using the same

A technology of pipe joints and air flotation, applied in the direction of pipes/pipe joints/fittings, pipe elements, adjustable connections, etc., can solve problems such as unrealized engineering, and achieve the effect of reducing disturbance

Active Publication Date: 2015-08-26
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the technology is still in the conceptual design stage and has not yet been engineered.

Method used

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  • Air flotation pipe joint assembly and six-degree-of-freedom air flotation pipe joint and mask table using the same
  • Air flotation pipe joint assembly and six-degree-of-freedom air flotation pipe joint and mask table using the same
  • Air flotation pipe joint assembly and six-degree-of-freedom air flotation pipe joint and mask table using the same

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Embodiment Construction

[0038] In order to better understand the technical content of the present invention, specific embodiments are given together with the attached drawings for description as follows.

[0039] The invention provides a six-degree-of-freedom air flotation joint, which has the function of mixing and connecting vacuum and positive pressure air paths, and has a certain operating stroke in the six-degree-of-freedom direction.

[0040] Please refer to figure 2 figure 2 Shown is a schematic diagram of the principle of a six-degree-of-freedom air flotation pipe joint in a preferred embodiment of the present invention. from figure 2It can be seen from the figure that the pipe joint is mainly composed of Z-direction air bearing 201 (including 201a and 201b), Z-direction air pipeline 202, X-direction air bearing 203 (including 203a and 203b), X-direction air pipeline 204, The Y-direction air bearing 205 (including 205a and 205b ) and the Y-direction air pipeline 206 are composed. Vacuu...

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Abstract

The invention provides an air floating pipe joint component and a six-degree-of-freedom air floating pipe joint and a mask platform both applying the same. The six-degree-of-freedom air floating pipe joint is mainly composed of an X-direction air floating shaft rod, a Y-direction air floating shaft rod, a Z-direction air floating shaft rod, an X-direction air floating shaft sleeve, a Y-direction air floating shaft sleeve and a Z-direction air floating shaft sleeve, vacuum and barotropic gas provides air to a moving platform micropositioner through an air incoming block fixed on a coarse movement platform (or a cable platform), and a certain friction-free moving distance exists in each of six-degree-of-freedom directions of X / Y / Z / Rx / Ry / Rz, so that the problem of six-degree-of-freedom coupling of air delivery is completely solved, and disturbance on moving performance of the micropositioner due to rigidity of a hose itself can be effectively lowered. The air floating pipe joint component and the six-degree-of-freedom air floating pipe joint and the mask platform both applying the same have a vacuum and barotropic air way mixing and transferring function and have certain friction-free moving distances in the six-degree-of-freedom directions.

Description

technical field [0001] The invention relates to the field of photolithography devices in integrated circuit manufacturing, and in particular to an air flotation pipe joint assembly, a six-degree-of-freedom air flotation pipe joint and a mask table using the air flotation pipe joint assembly. Background technique [0002] The photolithography apparatus in the prior art is mainly used in the field of integrated circuit IC or flat panel display and the manufacture of other micro devices. With a photolithographic apparatus, multilayer masks with different mask patterns are sequentially imaged in precise alignment on a photoresist-coated wafer, such as a semiconductor wafer or an LCD panel. Lithography devices are generally divided into two categories, one is a stepping lithography device, the mask pattern is exposed and imaged on one exposure area of ​​the wafer, and then the wafer moves relative to the mask to move the next exposure area to the mask pattern and under the proje...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): F16L27/00F16L39/00F16C32/06G03F7/20
Inventor 江旭初
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD