Seam tracking device with double tracking probes
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- SHENYANG UNIV
- Publication Date
- 2013-11-13
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
technical field
[0001] The invention relates to a seam tracking device, in particular to a seam tracking device with double tracking probes. Background technique
[0002] The existing narrow-gap seam tracking methods generally include laser scanning, computer image recognition and so on. The disadvantage is that the principle is more complicated, and it is more difficult to repair once a fault occurs. Moreover, the anti-interference ability is poor and the cost is high. Contents of the invention
[0003] The object of the present invention is to provide a double-tracking probe weld seam tracking device, which adopts the tracking method of mechanical probes and sensors, does not need to replace the mechanical probes according to the shape of the weld seam, can be used in conjunction with welding tools, and can Overcome the influence of the defect of the narrow gap weld track on the welding accuracy, and improve the welding quality.
[0004] The purpose of the present inv...