Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Atmospheric visibility measuring device and its measuring method

A technology of atmospheric visibility and measuring devices, which is applied in the directions of measuring devices, scattering characteristics measurement, and material analysis through optical means, which can solve the problems of reducing the accuracy of visibility measurement, increasing the difficulty of measurement, interference, etc., and achieving simple structure and high precision. The effect of improving and reducing the difficulty of measurement

Inactive Publication Date: 2015-12-16
ANHUI INST OF OPTICS & FINE MECHANICS - CHINESE ACAD OF SCI
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, although this camera visibility meter has the characteristics of simple structure, easy installation, low cost, and is suitable for small stations and island platforms, it also has shortcomings. First, the measurement error of the visibility is less than 2000 meters is 10%. When the visibility is greater than 2000 meters, there is an error of about 30%; secondly, the selected light source is natural light during the day and light at night, which is very easy to be interfered and reduce the accuracy of visibility measurement; thirdly, with With the increase of the visibility measurement distance, the target needs to be placed at the corresponding distance, which increases the difficulty of measurement

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Atmospheric visibility measuring device and its measuring method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0018] see figure 1 , the composition of the atmospheric visibility measurement device is as follows: the distance between the semiconductor laser 1 and the CCD industrial camera 5 is 5 (can be 3 ~ 6) m; wherein, the output wavelength of the semiconductor laser 1 is 550nm, the beam diameter is 3mm, and the divergence angle is 0.5 mrad, the semiconductor laser 1 is located on the second adjustment mount 10, the second adjustment mount 10 is a three-dimensional adjustment mount with pitch angle adjustment and 360-degree adjustment in the horizontal direction, and the CCD industrial camera 5 has 14 analog-to-digital conversion digits. The vertex of the quantum efficiency curve is 500 (can be 450-550) nm, the CCD industrial camera 5 is located on the first adjustment mount 6, and the first adjustment mount 6 is a three-dimensional adjustment mount with pitch angle adjustment and 360-degree adjustment in the horizontal direction .

[0019] There is an included angle of 10 (can be ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses an atmospheric visibility measuring device and a measuring method thereof. The measuring device comprises a CCD camera part and a microcomputer (8), which is electrically connected to the CCD camera part, especially the measuring device also comprises a semiconductor laser (1), the CCD camera part is a CCD industrial camera (5), the distance between the semiconductor laser (1) and the CCD industrial camera (5) is 3 to 6 m, the emitting light beam direction (2) of the semiconductor laser (1) forms a included angle of 8 to 12 degrees with the receiving light shaft (9) of the CCD industrial camera (5). The measuring method comprises following steps: respectively obtaining a laser-free background image and a laser test image, then eliminating the background image from the test image so as to obtain diffusion light data Is (theta), and then substituting the diffusion light data Is (theta) into the visibility L calculation formula to calculate so as to obtain the atmospheric visibility, wherein g is a dissymmetric factor, the value of g is 0.4 to 1, K is a instrument constant, the value of K is 8000 to 12000, theta is a diffusion angle, and the value of theta is 8 to 42 degrees. The atmospheric visibility measuring device is widely used for measuring high precise atmospheric visibility.

Description

technical field [0001] The invention relates to a visibility measuring device and a measuring method, in particular to an atmospheric visibility measuring device and a measuring method thereof. Background technique [0002] Visibility is an important element of meteorological observation. The forecasting of its value can be used in the weather analysis of the meteorological department, and can be widely used in aviation, navigation, highway and other transportation departments, military and environmental monitoring and other fields. The early meteorological departments used the traditional visual method to observe the visibility. This method is affected by the physiological and psychological factors of the observers, which is relatively subjective and has a limited observation range, especially the accuracy of night observation is difficult to guarantee. Recently, in order to solve this problem, people have made some attempts and efforts, such as in "Using Digital CCD Camera...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G01N21/49G01N21/01
Inventor 孟祥谦胡顺星邵石生
Owner ANHUI INST OF OPTICS & FINE MECHANICS - CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products