Method for preparing integrated silicon piezoresistive type sensor chip preparing and sensor chip
A sensor chip, silicon piezoresistive technology, applied in piezoelectric devices/electrostrictive devices, piezoelectric/electrostrictive/magnetostrictive devices, instruments, etc., can solve problems such as small size and reduce chip size volume effect
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[0035] see figure 1 and figure 2 As shown, this embodiment specifically describes a method for preparing an integrated silicon piezoresistive sensor chip, which includes the following steps:
[0036] 1. Use thermal oxidation to grow silicon dioxide (SiO2) on both sides of a single crystal silicon wafer. 2 ) film layer;
[0037] 2. Perform photolithography in the design area of the silicon wafer square diaphragm 11 and the cantilever beam 17 to form the light boron varistor strip diffusion area;
[0038] 3. Etch the SiO in the diffusion area of the light boron varistor strip 2 film layer;
[0039] 4. Using the diffusion method, the light boron varistor strip 10 is formed;
[0040] 5. Etching off SiO 2 film layer;
[0041] 6. Use thermal oxidation to grow SiO on both sides of the silicon wafer 2 film layer;
[0042] 7. Photolithography is performed on the upper surface of the silicon wafer to form a thick boron resistance ohmic contact area;
[0043] 8. Etch the S...
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