One-time eroding-before-plating metal frame subtraction embedded chip inversely-arranged salient point structure and technological method
A technology of bump structure and process method, which is applied in the direction of electrical components, electrical solid devices, circuits, etc., can solve the problems of lack of system functions in metal lead frames, and achieve the effects of improving heat dissipation, reducing costs, and small size
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[0053] The process method of the present invention, which is etched first and then plated with a metal frame, is as follows:
[0054] Step 1. Take the metal substrate
[0055] see figure 1 , take a piece of metal substrate with appropriate thickness, the material of this plate is mainly metal material, and the material of metal material can be copper, iron, galvanized, stainless steel, aluminum or metal that can achieve conductive function Material or non-all-metal material, etc., the choice of thickness can be selected according to product characteristics.
[0056] Step 2. Paste photoresist film
[0057] see figure 2 , A photoresist film that can be exposed and developed is pasted on the front and back of the metal substrate to protect the subsequent etching process. The photoresist film can be a dry photoresist film or a wet photoresist film.
[0058] Step 3. Remove part of the photoresist film from the surface of the metal substrate
[0059] see image 3 , using exp...
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