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Preparation method of optical interference color-change pigment with relatively high saturation degree

An optical interference and color-changing pigment technology, applied in chemical instruments and methods, inorganic pigment treatment, fibrous fillers, etc., can solve the problem of low color saturation in the transition area of ​​optical interference pigments, affecting application, and insignificant color change in the color-changing transition area. And other issues

Inactive Publication Date: 2014-05-21
SHANGHAI NAT ENG RES CENT FORNANOTECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

But in contradiction to this, when the n value difference between the high and low refractive index thin layer materials is too large, it will lead to the disadvantages of low color saturation in the transition area of ​​the light interference pigment, and the color change in the color transition area is not obvious, etc., thus It affects its application in some high-end fields such as paints, coatings, and ceramics
In addition, the wet chemical coating method is mainly used to prepare light interference pigments at present, but the wet chemical method cannot accurately control the thickness of each film layer, which often causes the inherent smoothness of the surface of the sheet substrate to deteriorate, and cannot make full use of the reflected light on the surface of the sheet , to achieve excellent optical expression

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0020] Put the flake substrate mica (20-60 microns in size) into the attached powder sample attachment of the atomic layer deposition equipment, then place it in the reaction chamber, and evacuate to 10-16hPa. When the temperature of the reaction chamber reaches 150°C, the process of atomic layer deposition of zinc oxide H layer begins: the diethyl zinc precursor is injected into the reaction chamber with a pulse of high-purity nitrogen gas for 0.1 seconds, and is chemically adsorbed on the mica, and then injected for 3 seconds High-purity nitrogen pulses clean the excess diethylzinc that is physically adsorbed on the substrate and in the reaction chamber; then a 0.1-second water vapor pulse is introduced to chemically adsorb to the first reaction substance, and then 4-second high-purity nitrogen pulses are used to clean it away excess water vapor. The above process completes one cycle of zinc oxide thin film deposition, repeating the above process 271 times to obtain a high r...

Embodiment 2

[0022] Put the flake substrate mica (20-60 microns in size) into the attached powder sample attachment of the atomic layer deposition equipment, then place it in the reaction chamber, and evacuate to 10-16hPa. When the temperature of the reaction chamber reaches 150° C., deposit 271 times to obtain a high-refractive-index zinc oxide H layer with a thickness of about 54 nm and a refractive index of 2.1. deposition M 1 : First deposit 9 times of high refractive index zinc oxide H layer; then deposit 1 time of low refractive index aluminum oxide L layer (the refractive index of aluminum oxide is about 1.78); repeat the above process 30 times to obtain an oxide layer with a thickness of about 57nm A zinc-alumina layer with a refractive index of approximately 2.0. Redeposition M 2Layer: Deposit 2 high-refractive index zinc oxide H layers first, and then deposit 1 low-refractive index aluminum oxide L layer, which is a cycle. Repeat the above process 130 times to obtain a zinc ox...

Embodiment 3

[0024] Put the flake substrate mica (20-60 microns in size) into the attached powder sample attachment of the atomic layer deposition equipment, then place it in the reaction chamber, and evacuate to 10-16hPa. When the temperature of the reaction chamber reaches 150° C., deposit 729 times to obtain a high-refractive index titanium oxide H layer with a thickness of about 51 nm and a refractive index of 2.4. deposition M 1 : First deposit 26 times of high refractive index titanium oxide H layer; then deposit 1 low refractive index aluminum oxide L layer (the refractive index of aluminum oxide is about 1.78); repeat the above process 28 times to obtain an oxide layer with a thickness of about 53nm A titanium-alumina layer with a refractive index of about 2.3. Redeposition M 2 Layer: 16 high-refractive-index titanium oxide H layers are deposited first, and then low-refractive-index aluminum oxide L layer is deposited once, which is a cycle. The above process was repeated 43 tim...

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Abstract

The invention relates to a preparation method of an optical interference color-change pigment with relatively high saturation degree. The preparation method is characterized by comprising the following steps: alternately depositing oxide films with high refractive index and low refractive index on the mica or metal sheet or glass sheet substrate by the atomic layer deposition technology; and depositing multiple layers of medium-refractive index multi-layer films gradually changing in refractive index between the two layers of films, and accurately controlling the refractive index and thickness of each film layer material to obtain the optical interference color-change pigment with relatively high saturation degree. The atomic layer deposition method can guarantee the inherent smoothness of the surface of the sheet substrate, the good covering ability is achieved, and the expression of optical interference color is sufficiently realized.

Description

technical field [0001] The invention relates to a method for preparing optical interference color-changing pigments by applying atomic layer deposition technology, in particular to a method for preparing interference pigments capable of improving pigment saturation. The interference pigment of multi-layer metal oxide thin film with gradient refractive index is prepared on flake mica and metal thin substrate by atomic layer deposition technology, and it presents different colors with different viewing angles. Background technique [0002] It is well known that alternately depositing specific thicknesses of high-refractive-index and low-refractive-index multilayer thin-film materials can produce specific optical interference colors. The refractive index and thickness of the film material determine the optical effect of the interference color. It is inferred from the theory of multilayer optical films that the brighter the interference color is when the difference between the ...

Claims

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Application Information

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IPC IPC(8): C09C3/06C09C1/40C09C1/00
Inventor 姜来新尹桂林何丹农
Owner SHANGHAI NAT ENG RES CENT FORNANOTECH
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