Preparation method of metal oxide-porous nano films (MO-PNFs)
A nanostructure and oxide technology, applied in nanotechnology, metal material coating process, ion implantation plating, etc., can solve the problems of complex process, easy to damage porous structure, pore size, distribution and area limitation, etc. Good uniformity, easy operation and good controllability
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Embodiment 1
[0027] 1) Using the JGP500A magnetron co-sputtering coating system, first fix the clean 321 stainless steel substrate on the sample plate, and then install the Cu target with a purity of 99.99% and the Al target with a purity of 99.9% respectively on the RF source and the On the DC source, and adjust the distance between the substrate and the two targets to be 15cm;
[0028] 2) Close the chamber door and evacuate to 4.5×10 -4 Pa, then the high-purity Ar gas with a flow rate of 20sccm and a purity of 99.999%, and keep the chamber pressure at 0.1pa;
[0029] 3) Simultaneously sputter the Cu target and the Al target with the power of RF200W and DC60W, respectively. After pre-sputtering for 30 minutes, adjust the rotation speed of the sample plate to 2r / min, remove the baffle and start depositing the Cu-Al alloy film at room temperature. The deposition time is 1h;
[0030] 4) The Cu-Al alloy film obtained by co-sputtering was directly corroded in 10mmol / L NaOH aqueous solution f...
Embodiment 2
[0032] 1) Same as embodiment 1;
[0033] 2) Same as embodiment 1;
[0034] 3) Same as embodiment 1;
[0035] 4) Alloy thin film at 7×10 -4 Annealed in Pa high vacuum for 30min, the annealing temperature is 400 ° C;
[0036] 5) The annealed Cu-Al alloy thin film was placed in 10mmol / L NaOH aqueous solution to corrode freely for 24h, then the sample was taken out, rinsed repeatedly with deionized water for more than 3 times and dried in the air. The product is similar to Example 1, which is a porous nanostructured film composed of many nanosheets. However, the surface of these nanosheets is rough and loose, and is composed of some nanoparticles of about 20nm; the nanopores are smaller, about 60nm.
Embodiment 3
[0038] 1) Same as embodiment 1;
[0039] 2) Same as embodiment 1;
[0040] 3) Same as embodiment 1;
[0041] 4) The annealing temperature is 600 ° C, all the other are with embodiment 2;
[0042] 5) Same as embodiment 2. The morphology of the obtained CuO product is as follows Figure 5 As shown, the product presents a typical "nanoparticle-nanohole" structure, and the size of both the nanoparticle and the nanohole is about 30 nm.
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