tiwn hard nanostructure film and preparation method

A nano-structure and thin-film technology, applied in ion implantation plating, metal material coating process, coating, etc., can solve the problems of TiN-based hard nano-structured composite films and multi-layer films with unsatisfactory friction and wear properties, and achieve The effect of high wear resistance

Inactive Publication Date: 2016-06-08
JIANGSU UNIV OF SCI & TECH
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] The purpose of the present invention is to overcome the deficiencies in the prior art, provide a kind of TiWN hard nanostructure thin film and preparation method, overcome existing TiN series hard nanostructure composite film and the shortcomings such as multi-layer film friction and wear performance is not ideal, has relatively High production efficiency, high hardness and excellent friction and wear properties, can be used as a nanostructured hard film for high-speed, dry cutting

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  • tiwn hard nanostructure film and preparation method

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preparation example Construction

[0014] The preparation method of the present invention is specifically as follows:

[0015] The preparation of TiWN composite film was completed on JGP-450 high vacuum multi-target magnetron sputtering equipment. The magnetron sputtering apparatus has three sputtering targets, which are respectively installed on three water-cooled brackets, and three stainless steel baffles are respectively installed in front of the three targets, and are automatically controlled by a computer. The pure Ti target (99.99%) and the pure W target (99.9%) are respectively installed on independent radio frequency cathodes, and the target diameter is 75mm. The surface of high-speed steel, single crystal silicon and other hard alloys or ceramic substrates is mirror-polished, and the vacuum chamber is filled with Ar and N with a purity of 99.999%. 2 The mixed gas is used to deposit a TiWN hard nanostructure composite film by using a pure Ti target and a pure W target on a hard alloy or ceramic substr...

Embodiment 1

[0018] Experimental parameters: Ti target power is 250W, W target power is 0W (W content is 0at.%), hardness is 20.12GPa, under dry cutting test, the average friction coefficient is 0.793, and the wear rate is 6.172×10 -8 mm 3 ·N -1 mm -1 .

Embodiment 2

[0020] Experimental parameters: Ti target power 250W, W target power 30W (W content 10.19at.%), hardness 22.71GPa, dry cutting test, friction coefficient 0.772, wear rate 5.133×10 -8 mm 3 ·N -1 mm -1 .

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Abstract

The invention discloses a TiWN hard nanostructure thin film and a preparation method. The thin film is characterized by being deposited on a hard alloy or a ceramic matrix by adopting a double-target confocal radio-frequency reaction sputtering method, wherein the molecular formula of the thin film is expressed as Ti (W, N), and the thickness of the thin film is 2-3 microns. During depositing, when the vacuum degree is superior to 3.0*10<-5>Pa, argon is used for arc striking, nitrogen is used as reaction gas for depositing, the sputtering pressure is 0.3Pa, and the flow ratio of argon to nitrogen is 10: (1-3). The sputtering power of a Ti target is 230-280W, and the sputtering power of a W target is 0-120W. An obtained hard coating comprehensively has excellent characteristics of high hardness and high abrasion resistance.

Description

technical field [0001] The invention relates to a coating and a preparation method thereof, in particular to a TiWN hard nanostructure composite film and a preparation method thereof, belonging to the technical field of ceramic coatings. Background technique [0002] With the development of modern processing technology, especially the emergence of high-speed, dry cutting and other processing methods, the coating applied to the tool is required to have higher hardness and excellent friction and wear properties. However, although the existing tool coatings have high hardness, their friction and wear properties are not ideal and cannot meet the requirements. Titanium nitride (TiN) thin films have attracted the attention of researchers due to their excellent properties such as high wear resistance, high hardness, and high chemical stability. In recent years, many scholars have studied the mechanical properties and friction and wear properties of TiAlN, TiVN, TiCN and other syst...

Claims

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Application Information

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Patent Type & AuthorityPatents(China)
IPC IPC(8): C23C14/34C23C14/06
Inventor喻利花许俊华董鸿志
OwnerJIANGSU UNIV OF SCI & TECH