Silicon-based CMOS image sensor and method of the silicon-based CMOS image sensor for restraining photon-generated carrier surface trap recombination
An image sensor and photo-generated carrier technology, applied in the field of microelectronics, can solve problems such as photo-generated carrier recombination, and achieve the effect of high photo-generated carrier transfer efficiency and low surface trap recombination rate
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[0029] The present invention will be further described below in conjunction with the accompanying drawings and embodiments.
[0030] The present invention is different from the traditional CMOS image sensor in that the trap suppression layer is formed by implanting two different positions, different energies and different doses, which can be formed by the following methods:
[0031] 1. If Image 6 As shown, after the polysilicon gate is formed, a low-dose P-type ion implantation is performed to form a shallow P-type trap prevention layer in the photosensitive area.
[0032] 2. If Figure 7 As shown, after the first layer of sidewall is formed by sidewall offset technology, a higher dose of P-type ion implantation is performed to form a shallower P+-type trap prevention layer in the photosensitive area.
[0033] 3. If Figure 8 As shown, after the second layer of sidewall deposition is formed, high-dose P-type ion implantation is performed to form a deeper P++-type trap prev...
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